Researches on selective electrochemical-etching for Cu/Ni sacrificial layers

Yong-hai LI,Gui-fu DING,Yong-hua ZHANG,Ying CAO
DOI: https://doi.org/10.3969/j.issn.1000-9787.2005.04.032
2005-01-01
Abstract:Wet chemical etching of sacrificial layers plays an important part in fabricating movable tree-dimensional micromachines by combination with MEMS technologies.The Cu/Ni laminated structure is etched by electrochemical etching in two varied etching solutions,and its I-V charactistic is measured.The results indicate that the electrochemical etching by potential control can etch Cu/Ni sacrificial layers with selection.
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