High-Frequency Performance of MoS2 Transistors at Cryogenic Temperatures

Qingguo Gao,Chongfu Zhang,Zhenfeng Zhang,Zichuan Yi,Xinjian Pan,Feng Chi,Liming Liu,Xuefei Li,Yanqing Wu
DOI: https://doi.org/10.1109/icsict49897.2020.9278023
2020-01-01
Abstract:Recently, due to its potential in high-speed flexible electronics, radio-frequency transistors based on two-dimensional MoS 2 has attracted the interest of researchers. However, for the moment, little is known on the RF performance of MoS 2 transistors at cryogenic temperatures, which is important for evaluating performance limits of high-frequency MoS 2 devices. In this work, we report the RF performance of MoS 2 transistors at cryogenic temperatures based on chemical vapor deposited bilayer MoS 2 for the first time. As the temperature reduces, the higher cut-off frequency was achieved. At the liquid helium temperature, extrinsic and intrinsic fT of 5.7 and 12.7 GHz for the transistor with 300 nm gate-length were achieved. Furthermore, saturation velocity and intrinsic fmax of 2.4×10 6 cm/s and 24 GHz were obtained at 4.3 K, respectively. The revealed high-frequency performances of MoS 2 transistors at cryogenic temperatures are helpful to the advancement of MoS 2 high-frequency electronics.
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