Effect Of Sf6 Flow Ratio On Microstructure And Properties Of Mgf2 Thin Films Prepared By Magnetron Sputtering

Chao Ma,Changjiang Zhao,Juncheng Liu,Zhigang Liu,Yan Chen
DOI: https://doi.org/10.1016/j.cplett.2020.138086
IF: 2.719
2021-01-01
Chemical Physics Letters
Abstract:In order to suppress F- deficiency of MgF2 film prepared with magnetron sputtering, the effects of SF6: Ar gas flow ratio on the structure and properties of the film were investigated. F: Mg ratio increased rapidly first then decreased with the increase of SF6 flow ratio, got 2.13 at 7%, closest to the stoichiometric ratio 2:1; while the film's refractive index first decreased and then increased, got a minimum at 550 nm 1.409 at 7%. MgF2 film increased the glass substrate transmittance within 300-1100 nm to 94.24% from 93.2%, and improved photoelectric conversion efficiency of GaAs solar cell by 2.1%.
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