Abstract:Moth eye protuberances, for instance, exhibit highly developed and well-organized nanostructures that allow them to adapt to a wide range of environmental conditions and achieve remarkable antireflective performance, which has inspired and been emulated by scientific advancement. Innovative studies have focused on bioinspired and imitating moth-eye patterns to provide a textured surface in multilayer antireflective coatings (ARC) using nanomaterials, polymers, or composites to eliminate undesired reflection in standard optical components and optoelectronic industrial applications. Multilayer AR systems provide a number of advantages over single-layer designs. Still, their limited applicability is due to obstacles such as mismatched properties at interfaces, high costs, poor mechanical durability, and wetting concerns. Using MgF2 and polytetrafluoroethylene, we develop a technique for fabricating high-performance AR nanostructures on borosilicate crown glass and Fluorine-doped Tin Oxide substrates via the glancing angle deposition technique. By inducing porosity and changing the deposition angle (α) at 550 nm, the refractive index of MgF2 is reduced from 1.38 to 1.14. In agreement with optical modelling predictions, high-performance ARC has been successfully produced on different substrates. Besides this, introducing a thin layer of polytetrafluoroethylene on MgF2 ARC via vapor deposition having a refractive index of 1.21 deposited at α ∼80° results in inducing water-repellent properties in ARC. Hence, our fabricated ARC yields stable AR efficiency with outstanding directional uniformity, durability, and negative temperature stability, having hydrophobic characteristics.

Preparation of Wide Optical Spectrum and High Antireflection MgF2 Thin Film with SF6 As Reactive Gas

Sputtering Power on the Microstructure and Properties of MgF2 Thin Films Prepared with Magnetron Sputtering

Effect Of Sf6 Flow Ratio On Microstructure And Properties Of Mgf2 Thin Films Prepared By Magnetron Sputtering

MICROSTRUCTURE AND STRESS PROPERTIES OF RADIO FREQUENCY MAGNETRON SPUTTERING MgF2 FILMS WITH DIFFERENT THICKNESSES

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Preparation and Characterization of Mg-doped ZnO Thin Films by Sol–gel Method

High-Light-Transmittance and Low-Haze Antifog MFI Zeolite Films Fabricated by Solvothermal Secondary Growth

Determination Of Refractive Indices And Thicknesses Of Ba0.7sr0.3tio3 Films With And Without Mgo (001) Buffer Layer On Silicon Substrate

Influences of Sputtering Gas Pressure and Gas Flow Rate on Microwave Characteristics of Fecoalo Thin Films

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Structural, infrared optical and mechanical properties of the magnesium fluoride films

Characterization of AZO and Ag based films prepared by RF magnetron sputtering

Fabrication and Characterization of MgF2 Anti-reflective Films Comprising Dual-Layer Prepared by Physical Vapor Deposition Technique for Optoelectronic Applications

Transparent conductive F-doped SnO 2 films prepared by RF reactive magnetron sputtering at low substrate temperature

Sputtering deposition of transparent conductive F-doped SnO2 (FTO) thin films in hydrogen-containing atmosphere

Ga, Mg, F ternary-doped ZnO-based transparent conductive film prepared by radio-frequency sputtering with high transmittance

Investigation of deposition temperature effect on spatial patterns of MgF2 thin films

F, Mg and Ga co-doped ZnO transparent conductive thin films by dual-target magnetron sputtering: Fabrication, structure, and characteristics

Optical and mechanical properties of amorphous Mg-Si-O-N thin films deposited by reactive magnetron sputtering

Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets.