Abstract:The ablation threshold, depth and crater shape of fused silica for femtosecond laser processing are investigated theoretically and experimentally. Based on tracking the spatiotemporal distribution of the free electron density, free electron temperature, and laser intensity, the electron dynamics as well as the transient optical and thermophysical properties of femtosecond laser irradiated fused silica are quantitatively determined. The numerical model is validated by comparing the calculated threshold fluence, depth and crater shape of ablation with the experimentally measured ones at a wavelength of 800 nm. The free electron relaxation time at different laser fluences and pulse durations throughout the photoionization process and impact ionization process are probed. In the present work, the findings are as follows. 1) The electron relaxation time significantly affects the material optical properties and femtosecond laser energy absorption. The optical properties change dramatically. The fused silica becomes opaque for the case of laser irradiation with fluence higher than the ablation threshold. Moreover, the transition from electron-phonon collision to electron-ion collision accompanies with the femtosecond laser ablation of fused silica. 2) By using the proposed model, the experimentally observed saturation of ablation depth at high laser fluence is elucidated by the significant change of optical reflectivity and absorption coefficient. Both the results of theoretical simulation and experimental observation indicate that laser fluence has a strong influence on the shape of the ablation crater. The ablation volume increases sharply with the increase of laser fluence for femtosecond laser irradiation, compared with that for picosecond laser irradiation. 3) With the increase of femtosecond laser fluence, the ablation depth removal efficiency and ablation efficiency are both saturated, followed by slight decrements. The peak of ablation depth removal efficiency peak occurs at the femtosecond laser fluence close to 1.4 times of the ablation threshold. While the accuracy is slightly low due to the higher sensitivity of the ablation characteristics (ablation crater depth and ablation volume) to the shorter femtosecond laser pulse. For the femtosecond laser fluence higher than 3.5 times of the ablation threshold, good repeatability over a very wide fluence range can achieve accurate processing results, because a more consistent flat-bottom ablation profile tends to appear. However, the heat-affected zone leads the processing quality to degrade, compared with the scenario of femtosecond laser fluence close to the ablation threshold.

Ablation Enhancement of Fused Silica Glass by Femtosecond Laser Double-Pulse Bessel Beam

Controlling of Surface Ablation Threshold of Fused Silica by Double-Pulsed Femtosecond Laser

Bessel Beam Femtosecond Laser Interaction with Fused Silica Before and After Chemical Etching: Comparison of Single Pulse, MHz-Burst, and GHz-Burst

Single-crystal silicon ablation with temporally delayed femtosecond laser double-pulse trains

Micro-Channel Etching Characteristics Enhancement by Femtosecond Laser Processing High-Temperature Lattice in Fused Silica Glass

Theoretical and Experimental Research on a Spatially Modulated Femtosecond Bessel-Like Laser for Microdrilling in Silica Glass

Femtosecond Laser Processing of Fused Silica and Aluminum Based on Electron Dynamics Control by Shaping Pulse Trains

High-throughput Microchannel Fabrication in Fused Silica by Temporally Shaped Femtosecond Laser Bessel-beam-assisted Chemical Etching.

Theoretical and Experimental Research of Femtosecond Laser Processing Fused Silica

Dual-control of incubation effect for efficiently fabricating surface structures in fused silica

Enhancement of Ablation Efficiency by a Femto/nano-Second Dual-Beam Micromachining System

Research of Femtosecond Laser-Assisted Etching of Fused Silica Micro-Optics Devices

Effect of double-pulse-laser polarization and time delay on laser-assisted etching of fused silica

Fabrication of beam shapers in the bulk of fused silica by femtosecond laser pulses.

Enhancing the Expansion of a Plasma Shockwave by Crater-Induced Laser Refocusing in Femtosecond Laser Ablation of Fused Silica

Etching Rate Enhancement by Shaped Femtosecond Pulse Train Electron Dynamics Control for Microchannels Fabrication in Fused Silica Glass.

Doping Transition Metal Ions As A Method for Enhancement of Ablation Rate in Femtosecond Laser Irradiation of Silicate Glass

Spatiotemporal Probe into the Femtosecond Laser Processing of Fused Silica

Femtosecond Laser Double Pulses Nanofabrication on Silicon

Ablation Mechanism of Fused Silica under Femtosecond Laser Pulse

Liquid-Assisted Femtosecond Laser Precision-Machining of Silica.