Abstract:As a pillar material of semiconductors, single-crystal silicon (Si) has attracted much attention due to its excellent electronic properties. Meanwhile, femtosecond laser processing as a convenient fabrication method for miniaturized structures provides an effective way to improve the performance of Si-based devices. However, the final-state analysis of femtosecond laser-induced Si micro-nano structures remains to be explored. In this study, the evolution of the micro-nano structures and the variation of surface and subsurface damage with pulse number were studied. Based on the atomic structure, the amorphous layer, dislocation layer, and unaffected layer were found. The amorphous layer resulted from the re-solidification of melted materials. The dislocation layer consisted of dislocations and lattice distortion. The unaffected layer retained the initial lattice structure and was not affected by laser irradiation. The high temperature and stress induced by multiple pulses led to the stacking faults and nano-twins in the subsurface layer. The evolution of the Si structure was essentially a transition process from a dislocation layer to a high-density defect layer and a transition process from nanotips to laser-induced periodic surface structures. During this process, dislocations dominated the femtosecond laser-induced microstructural deformation, affecting the nano-hardness of the irradiated surface. As a result, the nano-hardness of Si structures fabricated using femtosecond laser processing was maximally enhanced by 9.54%. This work provides new information about ultrafast laser-induced surface and subsurface damage, which is significant for the efficient and high-precision fabrication of Si-based functional micro-nano devices.

Femtosecond Laser Double Pulses Nanofabrication on Silicon

Single-crystal silicon ablation with temporally delayed femtosecond laser double-pulse trains

Nanopatterning Of Silicon Via The Near-Field Enhancement Effect Upon Double-Pulse Femtosecond Laser Exposure

Effects of Parameters in Femtosecond Laser Micromachining on Ablation of Silicon

Effect of Laser Parameters in the Micromachining of Silicon by Femtosecond Pulse Laser

Controlling of Surface Ablation Threshold of Fused Silica by Double-Pulsed Femtosecond Laser

The influence of ultrafast temporal energy regulation on the morphology of Si surfaces through femtosecond double pulse laser irradiation

Efficiency of silicon micromachining by femtosecond laser pulses in ambient air

Ultrafast Dynamics of Femtosecond Laser-Induced High Spatial Frequency Periodic Structures on Silicon Surfaces

One-Step femtosecond laser irradiation of Single-Crystal Silicon: Evolution of Micro-Nano structures and damage investigation

Study of Nanosecond Pulse Laser Micro-Fabrication

Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale

Femtosecond Laser Ablation of Silicon in Air and Vacuum

Evolution of Microstructures on Silicon Induced by Femtosecond Laser with Multiple Pulses

Femtosecond Laser Induced Surface Structuring on Silicon by Diffraction-Assisted Micropatterning

Generation and erasure of femtosecond laser-induced periodic surface structures on nanoparticle-covered silicon by a single laser pulse.

Femtosecond laser induced ablation of crystalline silicon upon double beam irradiation

Mechanism of Femtosecond-Laser-induced Periodic Nanostructure Formation on Crystalline Silicon Surface Immersed in Water

Asymmetric Femtosecond Laser Ablation of Silicon Surface Governed by the Evolution of Surface Nanostructures

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Femtosecond Laser Nano-Fabrication With Extended Processing Range