Micro-Channel Etching Characteristics Enhancement by Femtosecond Laser Processing High-Temperature Lattice in Fused Silica Glass

Dongkai Chu,Xiaoyan Sun,Youwang Hu,Xinran Dong,Kai Yin,Zhi Luo,Jianying Zhou,Cong Wang,Ji'an Duan
DOI: https://doi.org/10.3788/col201715.071403
IF: 2.56
2017-01-01
Chinese Optics Letters
Abstract:A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability, the method of processing a high-temperature lattice by a femtosecond laser pulse train is provided. With the same pulse energy and scanning speed, the success probability can be increased to 98% by optimizing pulse delay. The enhancement is mainly caused by the nanostructure, which changes from a periodic slabs structure to some intensive and loose pore structures. In this Letter, the optimum pulse energy distribution ratio to the etching is also investigated.
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