Abstract:The ablation threshold, depth and crater shape of fused silica for femtosecond laser processing are investigated theoretically and experimentally. Based on tracking the spatiotemporal distribution of the free electron density, free electron temperature, and laser intensity, the electron dynamics as well as the transient optical and thermophysical properties of femtosecond laser irradiated fused silica are quantitatively determined. The numerical model is validated by comparing the calculated threshold fluence, depth and crater shape of ablation with the experimentally measured ones at a wavelength of 800 nm. The free electron relaxation time at different laser fluences and pulse durations throughout the photoionization process and impact ionization process are probed. In the present work, the findings are as follows. 1) The electron relaxation time significantly affects the material optical properties and femtosecond laser energy absorption. The optical properties change dramatically. The fused silica becomes opaque for the case of laser irradiation with fluence higher than the ablation threshold. Moreover, the transition from electron-phonon collision to electron-ion collision accompanies with the femtosecond laser ablation of fused silica. 2) By using the proposed model, the experimentally observed saturation of ablation depth at high laser fluence is elucidated by the significant change of optical reflectivity and absorption coefficient. Both the results of theoretical simulation and experimental observation indicate that laser fluence has a strong influence on the shape of the ablation crater. The ablation volume increases sharply with the increase of laser fluence for femtosecond laser irradiation, compared with that for picosecond laser irradiation. 3) With the increase of femtosecond laser fluence, the ablation depth removal efficiency and ablation efficiency are both saturated, followed by slight decrements. The peak of ablation depth removal efficiency peak occurs at the femtosecond laser fluence close to 1.4 times of the ablation threshold. While the accuracy is slightly low due to the higher sensitivity of the ablation characteristics (ablation crater depth and ablation volume) to the shorter femtosecond laser pulse. For the femtosecond laser fluence higher than 3.5 times of the ablation threshold, good repeatability over a very wide fluence range can achieve accurate processing results, because a more consistent flat-bottom ablation profile tends to appear. However, the heat-affected zone leads the processing quality to degrade, compared with the scenario of femtosecond laser fluence close to the ablation threshold.

Experimental Investigation on Processing of Fused Silica Microchannels by High Repetition Rate Femtosecond Laser

Experimental study on direct fabrication of micro channel on fused silica by picosecond laser

Material Removal Effect of Microchannel Processing by Femtosecond Laser

Fabrication of millimeter-scale deep microchannels in fused silica by femtosecond laser filamentation effect

Experimental Research on CO_2 Laser Direct-writing Machining PMMA Microchannel

Fabrication of Microchannels on Silica Glass by Femtosecond Laser Multi-Scan： from Surface Generation Mechanism to Morphology Control

Thermal Diffusion and Thermal Melting in Femtosecond Laser Micromachining

Shape Regulation of Tapered Microchannels in Silica Glass Ablated by Femtosecond Laser with Theoretical Modeling and Machine Learning.

Influence of Processing Parameters on the Structure Size of Microchannel Processed by Femtosecond Laser

Spatiotemporal Probe into the Femtosecond Laser Processing of Fused Silica

High-throughput Microchannel Fabrication in Fused Silica by Temporally Shaped Femtosecond Laser Bessel-beam-assisted Chemical Etching.

Femtosecond Laser Microchannels Fabrication Based on Electrons Dynamics Control Using Temporally or Spatially Shaped Pulses

Research on Laser-Assisted Micro-Milling of Fused Silica

Investigation of Microchannels on K24 Alloy by Femtosecond Laser Considering the Incubation of Laser Pulse

Theoretical and Experimental Research of Femtosecond Laser Processing Fused Silica

Study on the Machining Mechanism of Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma

Experimental Investigation on Laser In-Situ Assisted Ultra-Precision Cutting of Fused Silica

Advances in Femtosecond Laser Fabrication of Microchannels

Phenomenological Modeling for Femtosecond Laser Processing of Fused Silica

Research of Femtosecond Laser-Assisted Etching of Fused Silica Micro-Optics Devices

Micro-Channel Etching Characteristics Enhancement by Femtosecond Laser Processing High-Temperature Lattice in Fused Silica Glass