New Growth Mode of Vanadium Dioxide Films

Wei Xiongbang,Jiang Yadong,Wu Zhiming,Liao Jiaxuan,Jia Yuming,Tian Zhong

2010-01-01

Rare Metal Materials and Engineering

Abstract:Vanadium dioxide (VO(2)) films with thickness of 1000 nm were deposited on Si (100) slice substrate by DC reactive magnetron sputtering method. The crystalline and morphology were analyzed by X-ray diffraction (XRD) and scanning electron microscope (SEM). A new growth mode of VO(2) was observed. XRD results show that the film deposited is multicrystal VO(2), which has the preferred orientation (200). SEM images reveal that the grains on the film surface increase with increasing of film thickness, and the grains exist in the form of particular "spindle-like" or "club-like" shape. "Column-growth" property was detected obviously, and the growth rate of column crystallization grains were quickly enhanced when the film thickness was beyond 380 nm. Thermal-resistance analysis suggests that the film has particular metal-semiconductor phase transition.