Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

The evolution of coating threshold damage to peeling off under femtosecond laser irradiation

Investigating the material properties of HfO2/SiO2-based anti-reflection coatings during 1064 nm laser-induced breakdown in air and vacuum conditions

Laser-induced layers peeling of sputtering coatings at 1064 nm wavelength

Material ejection and layer peeling-off in HfO2/SiO2 thin-film beam splitters induced by 1ω and 3ω lasers

Transition from Isolated Submicrometer Pits to Integral Ablation of HfO 2 and SiO 2 Films under Subpicosecond Irradiation

Fatigue Effect of Hafnia/silica High-Reflective Coatings under Multiple Laser Pulses at 1064 Nm

The Evolution of Ablation Area Induced by Femtosecond Laser

Temporal Scaling Law and Intrinsic Characteristic of Laser Induced Damage on the Dielectric Coating

Surface Evolution and Laser Damage Resistance of CO2 Laser Irradiated Area of Fused Silica

Study of micron-scale defects in optical coatings for high-power lasers deposited by ion beam sputtering

Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector

Physical Mechanism of Pulsed Laser Interaction with Fused Silica Optics During CO2 Laser Mitigation Process

Damage Morphologies of Al2O3 and Fe Particles Attached on the Input Surface of Fused Silica after Irradiation by a 355 Nm Laser.

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

The Electric Field Modulation by Lateral Crack Coated with Hfo2/Sio2 High Reflector

Study of Laser-Irradiated Thin Films

Theoretical and experimental study on femtosecond laser induced damage in CaF<sub>2</sub> crystals

Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Modulation of incident laser by the defect site with a contamination coating on fused silica surface

Dynamics of filamentary damage induced by nanosecond laser in fused silica