Abstract:Non-evaporable getter (NEG) films are widely used in high vacuum technologies and have played a critical role in applications requiring ultrahigh vacuum conditions, such as accelerator vacuum systems. The passivation layers on the film surface due to air exposure generally require thermal vacuum activation. This research aims to elucidate the key factor in the activation of TiZrV NEG films from the perspective of atomic-scale microstructures. The characteristics of film element distributions, morphologies, and crystalline states before and after activation were investigated by energy dispersive spectroscopy, scanning electron microscopy, and grazing incidence x-ray diffraction. In situ x-ray photoelectron spectroscopy was used to detect compositional variations in the film surface layer at different activation temperatures. According to the analysis, from an atomic-scale perspective, the easily activated structures would degrade in activation performance when surrounded by structures that are difficult to activate. During activation, the activated structures tend to act as channels for foreign atoms until the surrounding structures are fully activated. Hydroxyl and carbonyl groups are generally easier to activate than hydrocarbons and surface carbides, but even groups of the same type vary greatly in activation difficulty due to the differences in atomic-scale microstructures on the film surface. These findings provide valuable insight into the activation of NEG films and may be beneficial in the design of novel NEG films with excellent activation performance.

Activation Characterization of the Ti-Zr-V Getter Films Deposited by Magnetron Sputtering

Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation

Activation and pumping characteristics of Ti–Zr–V films deposited on narrow tubes

Testing the Activation Temperature of Non-Evaporable Ti-Zr-Hf-V Getter Films by XPS

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Deposition and Characterization of TiZrV Getter Films

Unveiling the Secrets of Non-Evaporable Getter Films: Activation Temperature, Activation Time, and Achievable Activation Degree

Deposition of Titanium-Zirconium-Vanadium Films by DC Magnetron Sputtering

Deposition of TiZrV Coatings Onto Inner Wall of Stainless Steel Pipe by DC Magnetron Sputtering

Development and Characterization of TiZrV Getter Films

Activation characterization of a novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getters by x-ray photoelectron spectroscopy

Formation Mechanism of Passivation Layer under Air Exposure on TiZrV Non-Evaporable Getter Film

Effect of Surface Oxide Layer on Activation Performance of Hydrogen Storage Alloy TiMn1.25Cr0.25

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Cage effect of film mesoscopic structure on activation of TiZrHfV non-evaporable getter

Crystallization Behaviors of TiO2 Films Derived from Thermal Oxidation of Evaporated and Sputtered Titanium Films

Effect of Surface Oxide Layer on the Activation Behavior of Timn1.25cr0.25 Hydrogen Storage Alloy

Activation and Hydrogen Absorption-Desorption Properties of Timn0.85cr0.35v0.3 Alloy

Study on the Electrical and Optical Properties of Vanadium Doped TiN Thin Films Prepared by Atmospheric Pressure Chemical Vapor

Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

Effect of V Addition on Activation Performances of TiMn1.25Cr0.25 Hydrogen Storage Alloy