Development and Characterization of TiZrV Getter Films

Bo Zhang,Wei Wei,Le Fan,Jianping Wang,Xiangtao Pei,Yuanzhi Hong,Yufang Zhang,Weimin Li,Yong Wang
DOI: https://doi.org/10.3969/j.issn.1672-7126.2012.02.06
2012-01-01
Abstract:The TiZrV films, as a non-evaporable getter (NEG) material, were deposited on the inner walls of stainless tube by DC magnetron sputtering. The impacts of the deposition and activation conditions on the gas absorption characteristics of the TiZrV films were evaluated. The tests with CO and H 2 gases were conducted after the setup was baked at 200°C for 24 h. The results show that the TiZrV films works well as a NEG material. It has a pumping speed of 0.23 L·s -1·cm -2 and an absorption capacity of 6.8×10 -5 Pa·L·cm -2 for CO, and the counter parts for H 2 are 0.02 L·s -1·cm -2 and 6.6×10 -2 Pa·L·cm -2, respectively. We found that the gettering performance improves, as the activation temperature rises up and lasts for a longer time.
What problem does this paper attempt to address?