Growth of High-Quality Multi-Crystalline Silicon Ingot by Using Si Particles Embedded in the Si3N4 Layer

Qi Lei,Liang He,Liang Ming,Changxin Tang,Senlin Rao,Lang Zhou
DOI: https://doi.org/10.1016/j.jcrysgro.2020.125774
IF: 1.8
2020-01-01
Journal of Crystal Growth
Abstract:This work proposes to utilize Si particles embedded in Si3N4 layer as low-cost seeds to produce high-quality multi-crystalline silicon (mc-Si) ingot by full-melting process. The nucleation mechanism and its effects on minority carrier lifetime distribution, PL defects and oxygen concentration were studied. The results show that the incompletely melted silicon particles embedded in the Si3N4 layer can effectively nucleate fine grains with uniform size and few defects. The yield of experiment ingot can be significantly increased due to the quite short length of bottom red zone. Finally, the prepared solar cells can also achieve high conversion efficiency and show low light-induced degradation (LID) value.
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