Low Tinv (≤ 1.8 nm) Metal-Gated MOSFETs on SiO2 Based Gate Dielectrics for High Performance Logic Applications
V. Ku,R. Amos,A. Steegen,C. Cabral,V. Narayanan,P. Jamison,P. Nguyen,Y. Li,M. Gribelyuk,Y. Wang,J. Cai,A. Callegari,F. McFeely,F. Jamin,K. Wong,E. Wu,A. Chou,D. Boyd,H. Ng,M. Ieong,C. Wann,R. Jammy,W. Haensch
DOI: https://doi.org/10.7567/SSDM.2003.B-7-1
2003-01-01
Abstract:V. Ku, R. Amos, A. Steegen, C. Cabral, Jr.*, V. Narayanan*, P. Jamison*, P. Nguyen, Y. Li, M. Gribelyuk, Y. Wang, J. Cai*, A. Callegari*, F. McFeely*, F. Jamin, K. Wong, E. Wu, A. Chou, D. Boyd*, H. Ng, M. Ieong*, C. Wann, R. Jammy*, and W. Haensch* IBM Semiconductor Research and Development Center, Hopewell Junction, NY 12533, USA IBM T.J. Watson Research Center, Yorktown Heights, NY 10598, USA E-mail: vku@us.ibm.com, Phone: (845) 894-7011 Fax: (845) 892-6462