Backward rectifying and forward Schottky behavior at doped interface

Yimin Cui,Rongming Wang
IF: 4
2007-01-01
Applied Physics Letters
Abstract:The Au∕Nb-1.0wt%-doped SrTiO3 junctions were successfully fabricated by magnetic controlled sputtering and annealing process. Backward diodelike behaviors were observed in as-prepared junction and the one annealed at 350°C. Transition to Schottky behavior was found in the junction annealed at 750°C; the Schottky junction shows linear capacitance-voltage (C−2-V) relationship in the reverse condition with barrier heights determined to be 1.6eV. The results of current-voltage (I-V) measurements reveal that high temperature annealing can alter interface barrier and thereby ameliorate the stability of leakage current remarkably.
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