Preparation Study of Triangle Monocrystalline Silicon Support Grid Ultra-Thin Silicon Nitride X-ray Window

Shuo MA,Dan XIE,Jianlong XU,Yulin SUN,Tianling REN
DOI: https://doi.org/10.14106/j.cnki.1001-2028.2016.05.021
2016-01-01
Abstract:In this paper, the fabrication of the 35μm width triangle monocrystalline silicon support fine grid silicon nitride X-ray window was demonstrated. With 19.3% area of silicon support grid and about 50 nm thick silicon nitride film, the window has the ability to tolerate an atmospheric pressure difference. Compared to MEMS X-ray window in the past, this structure has more simple, reliable and low-cost manufacturing processes, which could be applied to X-ray fluorescence analyzer and SEM energy dispersive spectrum analyzer.
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