Abstract:Surface etching of single-crystal diamond (SCD) in hydrogen plasma plays a decisive role for high-quality homoepitaxy and surface conduction of diamond. The complexity of surface/subsurface condition such as defects would give rise to the distinct morphology features and even further result in the unpredictable properties. Correspondingly, the evolutionary relationship between the morphology and electrical properties of mechanically polished SCDs which have typical cleavage damage in microns depth after hydrogen plasma treatment still needs to be further completed. In this work, the chemical vapor deposited (CVD) SCDs with uniform polishing-caused subsurface cleavage were immersed in microwave hydrogen plasma for variable duration. Time-dependent morphological evolution, multi-mode etched pits (EPs) (resulting from local defects/cracks and dislocations) and associated etching mechanism were comprehensively studied. At the early stage of plasma treatment before 60 min, owing to the obvious surface roughing generated by preferential etching (with the rate of >400 nm/h) of severe mechanically damaged regions, the hole mobility was significantly deteriorated, also accompanying with the apparent drop of sheet concentration. Concurrently, the deposited surface sp2 amorphous carbon (a-C) nanodots on diamond surface and non-sp3 hydrogen bonds reconstruction, which arising from defect-etching produced local abundant carbon-containing radicals or possible exfoliation generated by hydrogen penetration of massive defective regions, also would play an adverse role for the conduction associated with (100) C–H surface. However, the surface roughness was reduced from the maximum 13.2 nm–4.2 nm by prolonging etching, resulting from the smoothing effect of small-angle crystal misorientation on waved height difference related to the uniform (111) cleavage and the removal of dense irregular EPs associated with polishing-induced local defects as well as the vanishing of surface a-C nanodots. In this case, the improvement of surface electrical properties together with the negative correlation of the mobility and sheet concentration were appeared by the gradual formation of (100) diamond surface and the building of uniform (100) C–H bonds.

Precise Characterization of Atomic-Scale Corrosion of Single Crystal Diamond in H2 Plasma Based on MEMS/NEMS

Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties

The Etching Mechanisms of Diamond, Graphite, and Amorphous Carbon by Hydrogen Plasma: A Reactive Molecular Dynamics Study

Electrical readout/characterization of single crystal diamond (SCD) cantilever resonators

Microwave hydrogen plasma etching on the laser-cut surface of single crystal diamond: Phases, etching morphology, stress evolution and the effect of etching on the subsequent homoepitaxial growth

The Influence of Hydrogen Plasma Etching on the Surface Conductivity of the Polycrystalline Diamond Surface and the Temperature-Dependent Properties

Atomic Scale Etching of Diamond: Insights from Molecular Dynamics Simulations

Single-crystal and polycrystalline diamond erosion studies in Pilot-PSI

Diamond Films and Particles Growth in Hydrogen Microwave Plasma with Graphite Solid Precursor: Optical Emission Spectroscopy Study

Optimizing hydrogen plasma etching process of preferred (110)-textured diamond film

Disclosing the Annihilation Effect of Ion-Implantation Induced Defects in Single-Crystal Diamond by Resonant MEMS

Homoepitaxy Growth of Single Crystal Diamond under 300 torr Pressure in the MPCVD System

Diagnostics of Plasma Emission Spectra During Electron Assisted Chemical Vapor Deposition of Diamond Films

Mechanistic Insights into the Formation of Dislocation-Related Pits on Diamond Surface under Plasma Etching Treatment: A Combined Simulation and Experimental Approach

High-selectivity Anisotropic Etching of Single-Crystal Diamond by H Plasma Using Iron Catalysis

Effect of Hydrogen Etching on the Electrical Prosperities of Nanocrystalline Diamond Film

Insights into the Atomic-Scale Removal Mechanism of Single Crystal Diamond in Plasma-Assisted Polishing with Quartz Glass

Surface Morphology and Spectroscopic Features of Homoepitaxial Diamond Films Prepared by MWPACVD at High CH4 Concentrations

High-rate Growth of CVD Single-Crystal Diamond and Its Application

Plasma Environment During Hot Cathode Direct Current Discharge Plasma Chemical Vapor Deposition of Diamond Films

Highly Selective Diamond and Β-Sic Crystal Formation at Increased Atomic Hydrogen Concentration: A Route for Synthesis of High-Quality and Patterned Hybrid Diamond/β-Sic Composite Film