Tunable 1/f Noise in CVD Bernal-Stacked Bilayer Graphene Transistors.

Mengchuan Tian,Qianlan Hu,Chengru Gu,Xiong Xiong,Zhenfeng Zhang,Xuefei Li,Yanqing Wu
DOI: https://doi.org/10.1021/acsami.9b21070
IF: 9.5
2020-01-01
ACS Applied Materials & Interfaces
Abstract:Low-frequency noise is a key performance limiting factor in almost all electronic systems. Thanks to its excellent characteristics such as exceptionally high electron mobility, graphene has high potential for future low noise electronic applications. Here we present an experimental analysis of low-frequency noise in dual-gate graphene transistors based on chemical vapor deposited Bernal-stacked bilayer graphene. The fabricated dual-gate bilayer graphene transistors adopt atomic layer deposited Al2O3 and HfSiO as top-gate and back-gate dielectric, respectively. Our results reveal an obvious M-shaped characteristic for the gate dependent noise behavior which can be well described by a quantitative charge-noise model. The minimal normalized noise spectral density at 10 Hz reaches as low as about 3×10-10 μm2·Hz-1 at room temperature, much lower than the best results previously reported for graphene devices. In addition, the observed noise level further decreases with more than ten times at temperature of 20 K. Meanwhile, the noise spectral density amplitude can be tuned by more than two orders of magnitude at temperature of 20 K by the dual-gate voltages.
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