High Performance Gigahertz Flexible Radio Frequency Transistors with Extreme Bending Conditions

Mengfei Wang,Mengchuan Tian,Zhenfeng Zhang,Shengman Li,Runsheng Wang,Chengru Gu,Xiaoyu Shan,Xiong,Xuefei Li,Ru Huang,Yanqing Wu
DOI: https://doi.org/10.1109/iedm19573.2019.8993531
2019-01-01
Abstract:In this work, ultrathin indium tin oxide (ITO) radio frequency (RF) transistors have been demonstrated for the first time, where inverted gate structure are used with a flexible polyimide substrate using magnetron sputtering at a thermal budget below 200 °C. The 160 nm channel length device exhibits excellent DC characteristics, including mobility of 26 cm 2 /V·s and an I on /I off ratio of 6.6×10 8 . A record-high extrinsic cut-off frequency (f T ) of 2.1 GHz and an extrinsic maximum oscillation frequency (f max ) of 3.7 GHz have also been obtained, which are more than one order of magnitude higher than previous results on flexible substrate. A high conversion gain of -20.9 dB has been achieved for the gigahertz frequency mixer based on flexible ITO RF transistor. Moreover, the stability of DC and RF performance under different bending conditions up to 50,000 bending cycles or down to 1 mm bending radius are studied without device failure.
What problem does this paper attempt to address?