Nanometre-thin Indium Tin Oxide for Advanced High-Performance Electronics

Shengman Li,Mengchuan Tian,Qingguo Gao,Mengfei Wang,Tiaoyang Li,Qianlan Hu,Xuefei Li,Yanqing Wu

DOI: https://doi.org/10.1038/s41563-019-0455-8

IF: 41.2

2019-01-01

Nature Materials

Abstract:Although indium tin oxide (ITO) is widely used in optoelectronics due to its high optical transmittance and electrical conductivity, its degenerate doping limits exploitation as a semiconduction material. In this work, we created short-channel active transistors based on an ultra-thin (down to 4 nm) ITO channel and a high-quality, lanthanum-doped hafnium oxide dielectric of equivalent oxide thickness of 0.8 nm, with performance comparative to that of existing metal oxides and emerging two-dimensional materials. Short-channel immunity, with a subthreshold slope of 66 mV per decade, off-state current <100 fA μm –1 and on/off ratio up to 5.5 × 10 9 , was measured for a 40-nm transistor. Logic inverters working in the subthreshold regime exhibit a high gain of 178 at a low-supply voltage of 0.5 V. Moreover, radiofrequency transistors, with as-measured cut-off frequency f T and maximum oscillation frequency f max both >10 GHz, have been demonstrated. The unique wide bandgap and low dielectric constant of ITO provide prospects for future scaling below the 5-nm regime for advanced low-power electronics.