Raman-based Measurement of Carrier Concentration in N-Type ZnO Thin Films under Resonant Conditions

Zhuang Mao,Cong Fu,Xinhua Pan,Xiangyang Chen,Haiping He,Wei Wang,Yujia Zeng,Zhizhen Ye
DOI: https://doi.org/10.1016/j.physleta.2019.126148
IF: 2.707
2020-01-01
Physics Letters A
Abstract:For Raman-based carrier concentration determination in thin film semiconductors, above-band-gap excitation is necessary, as the interference from underlying substrate is eliminated by limited photon penetration depth. With resonant Raman spectroscopy, this study investigates the plasmon-phonon coupled modes in n-type ZnO films to non-destructively probe the carrier concentration. The observed coupled mode slightly redshifts from A1(LO) frequency and fails to show monotonic carrier concentration dependency, which differs from the behavior under non-resonant conditions. The correlation between point defects and abnormal behaviors is studied both experimentally and theoretically. The second order LO phonons (2LO) instead of 1LO ones are applied in carrier concentration determination process, in order to avoid the influence from point defects. Reasonable results, especially in high carrier concentration range, are extracted from Raman spectra with the help of Lindhard-Mermin framework.
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