Mechanism of pulsed-laser-induced oxidation of titanium films

Feng Xia,Lipeng Jiao,Di Wu,Shixia Li,Kun Zhang,Weijin Kong,Maojin Yun,Qian Liu,Xinzheng Zhang
DOI: https://doi.org/10.1364/OME.9.004097
2019-01-01
Optical Materials Express
Abstract:An axisymmetric model of 50 nm titanium thin film on glass substrate is proposed to study the mechanism of pulsed-laser-induced oxidation of titanium. The oxidation rate is determined by the oxygen ions migration rate, which is significantly influenced by the laser-induced Mott potential and temperature. The oxidation processes are calculated by finite-difference time-domain method. The simulation results are in good agreement with experiment results, which verify that the laser-induced Cabrera-Mott oxidation theory is the mechanism of laser-induced oxidation of titanium. This work is beneficial to study the improvements for fabricating TiO2 nanostructured materials on the resolution and efficiency. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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