Abstract:Precise control of the crystal phase of TiO2 by sputtering at room temperature is particularly important for practical applications. In this paper, nanocrystalline TiO2 films were deposited on glass and silicon substrates using DC reactive magnetron sputtering without external heating. The phase composition and preferred orientation of the TiO2 films could be controlled by adjusting the negative bias voltages. It was found that TiO2 films deposited at free negative bias voltage or ground exhibited an anatase single phase with a strong (101) preferred orientation, while the preferred orientation transformed into (211) when the negative bias voltage reached −50V. A further increase in the negative bias voltage induced the formation of an additional rutile phase, thus generating a mixed phase of anatase and rutile. A pure rutile phase was obtained at high negative bias voltage (≥−100V). The rutile phase with (101) preferred orientation could also be obtained by increasing the bias voltages above −125V. In addition, the TiO2 films of different phases performed different photocatalytic activities. The anatase TiO2 films showed higher photocatalytic activity than rutile phase films. Particularly, anatase TiO2 films with (211) preferred orientation showed a significant photocatalytic degradation of organic dye (Rhodamine B), the degradation of which reached over 90% after an irradiation time of 2h.

Preparation and Properties of Titanium Oxide Thin Film by Midfrequency Alternative Reactive Magnetron Sputtering Technique

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Controllable hydrothermal synthesis, optical and photocatalytic properties of TiO 2 nanostructures

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Influence of Annealing Temperature on the Properties of Titanium Oxide Thin Film

Investigations of Tio2 Films Prepared by Reactive Magnetron Sputtering

Optimization of Ti2O3 thin films by magnetron sputtering and study of their photoelectric performance

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Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Effect of the Substrate Temperature on the Crystallization of TiO2 Films Prepared by DC Reactive Magnetron Sputtering

Preparation and Properties of P-type Conducting Titanium Oxide Film

Compositional and Structural Evolution of the Titanium Dioxide Formation by Thermal Oxidation

A New Low-Emissivity Films Prepared by Magnetron Sputtering

The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering

Structure and Transport Properties of Titanium Oxide (ti2o, TiO1+, and Ti3O5) Thin Films

Studies of Photo-induced Characteristics of Nanoscale Titanium Dioxide Thin Films Grown by RF Magnetron Sputtering

Titanium monoxide and titanium dioxide thin film formation by magnetron sputtering and its thermodynamic model

Structural and optical characterization of TiO2 films deposited by reactive magnetron sputtering at different oxygen pressures

Photoelectrochemical Characteristics of Nano-Titanium Dioxide Thin Films Prepared by RF Magnetron Sputtering

Comparative Experimental Investigation of Mechanical Properties and Adhesion of Low Temperature PVD Coated TiO2 Thin Films