Structural and optical characterization of TiO2 films deposited by reactive magnetron sputtering at different oxygen pressures

朱凤,赵坤,赵夔,王莉芳,全胜文

DOI: https://doi.org/10.3969/j.issn.1007-8924.2002.03.006

2002-01-01

Abstract:TiO_2 thin films were prepared by reactive magnetron sputtering. The influences of oxygen partial pressure on the structure and optical properties of TiO_2 films were studied. The results indicate that the crystal structure of film will change from rutile to anatase when oxygen partial pressure increases from 6×10 -2 Pa to 9×10 -2 Pa, and tend to become amorphous structure when the pressure is over 9×10 -2 Pa. Corresponding to the changes of structure, the band gap energy of the films will decrease at first, and then it increases again. However, the refractive index of film does not change like that. It only decreases from 2.44 to 1.96.