Physical mechanisms of endurance degradation in TMO-RRAM
Bin Chen,Yinxue Lü,Baohong Gao,Yue Fu,Feifei Zhang,Peng Huang,Yong Chen,Lifeng Liu,Xiaoyan Liu,Jinfeng Kang,Yangyuan Wang,Zheng Fang,Hongyu Yu,Xiang Li,Xinpeng Wang,Navab Singh,Guoqiang Lo,Dimlee Kwong
DOI: https://doi.org/10.1109/IEDM.2011.6131539
2011-01-01
Abstract:We report, for the first time, three types of endurance failure behaviors in TMO based RRAM. New physical mechanisms are proposed to clarify the physical origins of these endurance failures. A physically-based optimized switching mode is developed to improve the endurance of TMO-RRAM. A significantly enhanced endurance of >10 9 switching cycles was demonstrated in the HfO x/TiO x/HfO x/TiO x devices. © 2011 IEEE.