Fast Self-Assembly of Polystyrene-B-poly(fluoro Methacrylate) into Sub-5 Nm Microdomains for Nanopatterning Applications

Xuemiao Li,Jie Li,Chenxu Wang,Yuyun Liu,Hai Deng

DOI: https://doi.org/10.1039/c8tc06480f

IF: 6.4

2019-01-01

Journal of Materials Chemistry C

Abstract:Block copolymers with perfluoroalkyl side-chains can self-assemble rapidly at moderate temperatures to yield sub-5 nm domains.

What problem does this paper attempt to address?

Facile Engineering of Nano- and Microparticles Via Self-Assembly of Homopolymers

Xing Zhou,Xiaodong Li,Tie Mao,Jianxiang Zhang,Xiaohui Li

DOI: https://doi.org/10.1039/c1sm05469d

IF: 4.046

2011-01-01

Soft Matter

Abstract:We report an unprecedented assembling performance of amide-containing, homo-structured poly(N-alkylacrylamide)s, through which they can assemble into discrete spherical particles with size ranging from tens of nanometres to several micrometres. For a specific polymer, a facile control over topology and scale of assembled structures can be accomplished via solvent conditions. Assembling using appropriate solvent gives rise to capsule-like assemblies. The molecular structure of polymers, such as the side chain chemistry and topology display striking impact on the size and morphology of resulting assemblies. These polymers might function as novel model systems for investigating complex functions performed by amide moieties in proteins, while this assembling offers a simple, facile but powerful and cost-effective manufacturing route for nano- or microstructured materials that may find great potential in diverse applications varying from cosmetics, drug delivery, nanomedicine, to biotechnology.
Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Ling-Shu Wan,Paulina A. Rincon Delgadillo,Roel Gronheid,Paul F. Nealey

DOI: https://doi.org/10.1116/1.4818882

2013-01-01

Abstract:In this work ternary blends of symmetric lamellae-forming poly(styrene-block-methyl methacrylate) block copolymer and polystyrene and PMMA homopolymers were prepared for the directed self-assembly (DSA) on chemically nanopatterned substrates using 2x density multiplication. Homopolymers with comparable molecular weights to that of the corresponding blocks in the block copolymer were used to adjust the periods of the blends. The periods of the blends increased from 38.5 to 50 nm as the volume fraction of homopolymers increased from 0 to 30%. The periods were analyzed by grazing-incidence small-angle X-ray scattering, direct measurement from and fast Fourier transform of scanning electron microscopy images. DSA results indicate that the perfection and registration of the assembled films were mainly determined by the commensurability between the periods of the blends and the chemical patterns. Patterns with relatively small w/L-S (guiding stripe width/period of chemical pattern) led to mixed structures of dots and parallel structures. The process window of L-S where the block copolymer alignment shows a high degree of perfection was estimated at +/- 3.6% to +/- 4.6% L-o. (C) 2013 American Vacuum Society.
A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Xiang Gao,Wei Feng,Shiping Zhu,Heather Sheardown,John L. Brash

DOI: https://doi.org/10.1021/la800729c

IF: 3.9

2008-01-01

Langmuir

Abstract:Poly(oligo(ethylene glycol) methacrylate) (POEGMA) block poly(methyl methacrylate) (PMMA) brushes were synthesized on the silicon wafer surfaces by the surface-initiated atom transfer radical polymerization (ATRP) method. Atomic force microscopy, ellipsometry, and water contact angle methods were employed to study the surface morphology and stimulus-response behavior. It was found that simple solvent treatments could induce phase segregation of the POEGMA and PMMA segments thus introducing nanoscale patterns. The feature size could be less than 10 nm and was tunable on the nanoscale. Various patterns including spherical aggregates, wormlike aggregates, stripe patterns, perforated layers, and complete overlayers were obtained through adjusting the upper block layer thickness. These patterns could switch between the different morphologies reversibly after the treatment with selective solvents.
Design and synthesis of novel directed self-assembly block copolymers for sub-10 nm lithography application

Jie Li,Xuemiao Li,Hai Deng

DOI: https://doi.org/10.1109/CSTIC.2017.7919776

2017-01-01

Abstract:A series of novel block copolymers, PS-b-PPDMA, were synthesized via anionic polymerization. Small-angle X-ray scattering (SAXS) spectra and Transmission electron microscope (TEM) images indicated lamella or hexagonal structures with a sub-10 nm half-pitch formed under mild thermal annealing condition. The assembly condition is as quick as 5 min or less at 100 °C thermal annealing. The smallest lamellar D spacing is 11.8 nm. These block copolymers show the potential as DSA material with high intrinsic resolution for sub-10 nm and beyond nodes.
Ultra-fast Directly Self-Assembly Materials for Sub-5 Nm Lithographic Patterning

Xuemiao Li,Chenxu Wang,Hai Deng

DOI: https://doi.org/10.1109/cstic.2018.8369209

2018-01-01

Abstract:The directed self-assembly (DSA) of block copolymers has attracted a great deal of interest due to its potential applications in sub-10 nm or sub-5 nm lithography [1-3]. The conventional organic-organic DSA materials such as poly-(styrene-block-methyl methacrylate) (PS-b-PMMA) have been extensively studied [4,5], however, the low etch contrast and the difficulty to reduce L0 limits its application. In this study, we designed and synthesized the novel DSA materials based on PS-b-PMMA. Through the modifying of acrylics part, segment-segment interaction parameter (x) can be significantly increased, which leads to rapid self-assembly and higher resolution.
Ultra-Fast Block Copolymers for Sub-5 Nm Lithographic Patterning

Xuemiao Li,Chenxu Wang,Jianuo Zhou,Zhenyu Yang,Yan Zhang,Hai Deng

DOI: https://doi.org/10.2494/photopolymer.31.483

2018-01-01

Journal of Photopolymer Science and Technology

Abstract:DSA lithography is a chemical assisted patterning approach, which has attracted a great deal of interest due to its potential high resolution and low cost. Researchers around the world discovered some sub-5 nm high resolution DSA materials, and all these materials required high annealing temperature or long annealing time. In this study, we design and synthesize some PS-typed and PMMA-typed fluoro-containing BCPs. The finest half pitch of these BCPs is less than 5 nm. And the thermal annealing time of PS-typed BCPs is optimized to 1 min, which has been the highest assembly speed for sub-5 nm nanopatterning. The self-assembly speed of PMMA-typed BCPs is much slower than the PS-typed. We further exhibit that ordered nanopatterns are assembled to appear straight 10 nm lines in the silicon template.
Synthesis of Fluorine-containing Polyacrylamide Block Copolymer and Their Application for Rapidly Formation of Sub-10 Nm Microdomains

Zhilong Li,Hai Deng

DOI: https://doi.org/10.2494/photopolymer.32.389

2019-01-01

Journal of Photopolymer Science and Technology

Abstract:Rapidly growing demand of shrinking the features of integrated circuits has accentuated the need for the next generation lithography. Among them, directed self-assembly (DSA) of block copolymers (BCPs) has attracted great interest due to their capability to form ordered nanopattern with high resolution and low cost. In this regard, several groups have investigated some high resolution DSA materials. However, all these materials required high annealing temperature or long annealing time. In this work, a series of polyacrylamide-based fluorine-containing BCPs were synthesized via reversible addition-fragmentation chain-transfer polymerization. One of the BCP materials can form sub-10 nm domains within 1 min at 80 degrees C. A domain spacing of BCP with hexagonal structure was further confirmed by SEM on a silicon wafer.
Facile synthesis and hierarchical assembly of polystyrene-block- poly (perfluorooctylethyl acrylates)

Hui Dai,Guang-Zhong Yin,Fangjia Zhao,Zhong-Xuan Bian,Yujie Xu,Wen-Bin Zhang,Xia-Ran Miao,Hui Li

DOI: https://doi.org/10.1016/j.polymer.2017.02.011

IF: 4.6

2017-01-01

Polymer

Abstract:Hierarchical assembly of macromolecules has been central in creating complex nanostructures. In this work, polystyrene-block-poly (perfluorooctylethyl acrylates) (PS-b-PFOA) diblock copolymers were synthesized by reversible addition-fragmentation chain transfer (RAFT) polymerization and shown to assemble into hierarchical structures in bulk with the interplay of nanophase separation and crystallization. The molecular weights were determined by gel permeation chromatography (GPC) and 1H NMR spectra. The phase-separated nanostructures of these block copolymers were investigated via small-angle X-ray scattering (SAXS) and wide-angle X-ray diffraction (WAXD) in reciprocal space and by transmission electron microscopy (TEM) in real space. The results showed that well-ordered lamellar morphologies were formed in the bulk of samples with volume fraction of PFOA (fPFOA) around 0.390–0.538. Within the PFOA layers, the side chains were found to further crystallize, forming crystalline layers with thicknesses about twice that of the length of fluorinated side-chains. The SAXS patterns from sheared samples further show that the orientation of crystalline layers was perpendicular to the lamellar layers formed by micro-phase separation.
Directed Self-Assembly of Poly(styrene-B-vinyl Acetate) Block Copolymers on Chemical Patterns for Sub-10 Nm Nanopatterning Via Thermal Annealing

Hanwen Lai,Xiaohui Zhang,Guangcheng Huang,Yadong Liu,Weihua Li,Shengxiang Ji

DOI: https://doi.org/10.1016/j.polymer.2022.125277

IF: 4.6

2022-01-01

Polymer

Abstract:Directed self-assembly (DSA) of block copolymers (BCPs) is an effective approach for the fabrication of sub-10 nm features for semiconductor devices. Although many high-chi BCPs have been developed for DSA, the major-ity of them has a significant difference in surface energies (gamma s) between two blocks. Here we report the synthesis and self-assembly of poly (styrene -b-vinyl acetate) (PS-b-PVAc). PS-b-PVAc has a higher Flory-Huggins interac-tion parameter (chi) than poly (styrene -b-methyl methacrylate) (PS-b-PMMA) and the smallest achievable period (LO) is 18.2 nm. PS and PVAc have nearly equal gamma s and a perpendicular orientation of domains is obtained on random copolymer brushes under thermal annealing. DSA of PS-b-PVAc (SV-1 and SV-2) is successfully demonstrated in the thin films on chemical patterns, and the feature size down to 9.5 nm is obtained in DSA of SV-4 with 2 x density multiplication. These results demonstrate that PS-b-PVAc could be a candidate BCP for next-generation DSA lithography.
Poly(2-vinylpyridine)-b-poly(fluorinated Methacrylate) Block Copolymers Forming 5 Nm Domains Containing Metallocene

Xuemiao Li,Hai Deng

DOI: https://doi.org/10.1021/acsapm.0c00608

2020-01-01

ACS Applied Polymer Materials

Abstract:Directed self-assembly (DSA) of thin films of a block copolymer (BCP) is a promising approach for sub-10 nm lithographic patterning. In this paper, a series of poly(2-vinylpyridine)-block-poly(penta-decafluorooctyl methacrylate) (P2VP-bPPDFMA) and poly(2-vinylpyridine)-block-poly(heptafluorobutyl methacrylate) (P2VP-b-PHFBMA) BCPs are synthesized by living anionic polymerization. The molar ratio of the two blocks and the degree of polymerization enable precise control of the morphology and size of the microdomains of the BCPs. The resulting materials form sub-5 nm scale microphase-separated structures, as seen with small-angle X-ray scattering and transmission electron microscopy. The introduction of the fluorine-containing blocks leads to a significant increase in the Flory-Huggins interaction parameter (.) between the two blocks, as determined with the mean-field theory. The temperature dependence of chi(2VP/PDFMA) is chi = 48.79/T + 0.272 (0.387 at 150 degrees C) and of chi(2VP/HFMBA) is chi = 2.29/T + 0.342 (0.347 at 150 degrees C). chi of each of these BCPs is 4 times higher than that of polystyrene-block-poly(2-vinylpyridine) (0.083 at 150 degrees C). The resulting smallest domain spacing of these BCPs is 8.3 nm in a lamellar morphology. The BCPs self-assemble into straight lines in a silicon trench template and the doping of the P2VP block with metal atoms can enhance their etch resistance, demonstrating the potential of these BCPs for advanced lithographic applications.
Facilitated and Site-Specific Assembly of Functional Polystyrene Microspheres on Patterned Porous Films

Ling-Shu Wan,Jie Lv,Bei-Bei Ke,Zhi-Kang Xu

DOI: https://doi.org/10.1021/am1009277

IF: 9.5

2010-01-01

ACS Applied Materials & Interfaces

Abstract:Functional patterned materials have received considerable attention because of their potential applications in biochips, sensors, and optical or electronic materials. Here, we report a versatile approach to functional patterned films based on facilitated and site-specific assembly of microspheres. This method includes the hierarchical formation of honeycomb-patterned porous films from amphiphilic block copolymers and the assembly of functional polystyrene microspheres driven by the gravity and the electrostatic interaction. Polystyrene microspheres containing carboxyl groups with a narrow size distribution were synthesized by dispersion polymerization. Honeycomb-patterned porous films were prepared from polystyrene-block-poly(N,N-dimethylaminoethyl methacrylate) (PS-b-PDMAEMA) by the breath figure method and then quaternized. We found that direct deposition of the microspheres on the patterned films reaches high filling ratio only when using ethanol dispersions that can wet the film pores. Plasma treatment of the films improves the hydrophilicity and introduces charged species to the external surface as well as the pore surface, leading to nonspecific assembly of microspheres. Negatively charged microspheres dispersed in buffer solution show a facilitated and site-specific assembly on the quaternized film. The electrostatic interaction as well as the gravity facilitates the assembly and the suborder arrangement of the hydrophilic PDMAEMA block around the pores is responsible for the site-specific assembly. In addition, we demonstrate the applicability of this method in preparing photoluminescent patterns by the assembly of porphyrinated microspheres, which is useful in various fields such as intelligent sensing.
Synthesis of a Fluoromethacrylate Hydroxystyrene Block Copolymer Capable of Rapidly Forming Sub-5 nm Domains at Low Temperatures

Chenxu Wang,Xuemiao Li,Hai Deng

DOI: https://doi.org/10.1021/acsmacrolett.9b00178

IF: 5.8

2019-01-01

ACS Macro Letters

Abstract:A series of poly(pentadecafluorooctyl methacrylate)-block-polyhydroxystyrene (PPDFMA-b-PHS) block copolymers (BCPs) were synthesized via reversible addition–fragmentation chain-transfer polymerization and subsequent deprotection. Because of the high incompatibility between hydroxyl groups and fluoro groups, the interaction parameter (χ) of these BCPs, determined by temperature-resolved small-angle X-ray scattering (SAXS), was extremely high. The χ value of PPDFMA-b-PHS was 0.48 at 150 °C, 16× larger than the χ of polystyrene-block-poly(methyl methacrylate). The microphase behavior of PPDFMA-b-PHS with various volume fractions of PHS block was determined by SAXS, yielding ordered lamellar morphologies with different sizes of domain spacing (d), and further confirmed by transmission electron microscopy. The minimum d obtained was 9.8 nm annealed at a mild temperature for a short time (80 °C for 1 min) by SAXS analysis, indicating the width of each lamellar domains was u003c5 nm.
Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Nathanael Wu,J. Buriak,C. Jin,E. Luber,B. Olsen

DOI: https://doi.org/10.1021/acs.langmuir.6b01365

IF: 3.9

2016-06-01

Langmuir

Abstract:Bottom-up self-assembly of high-density block-copolymer nanopatterns is of significant interest for a range of technologies, including memory storage and low-cost lithography for on-chip applications. The intrinsic or native spacing of a given block copolymer is dependent upon its size (N, degree of polymerization), composition, and the conditions of self-assembly. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymers, which are well-established for the production of strongly segregated single-layer hexagonal nanopatterns of silica dots, can be layered sequentially to produce density-doubled and -tripled nanopatterns. The center-to-center spacing and diameter of the resulting silica dots are critical with respect to the resulting double- and triple-layer assemblies because dot overlap reduces the quality of the resulting pattern. The addition of polystyrene (PS) homopolymer to PS-b-PDMS reduces the size of the resulting silica dots but leads to increased disorder at higher concentrations. The quality of these density-multiplied patterns can be calculated and predicted using parameters easily derived from SEM micrographs of corresponding single and multilayer patterns; simple geometric considerations underlie the degree of overlap of dots and layer-to-layer registration, two important factors for regular ordered patterns, and clearly defined dot borders. Because the higher-molecular-weight block copolymers tend to yield more regular patterns than smaller block copolymers, as defined by order and dot circularity, this sequential patterning approach may provide a route toward harnessing these materials, thus surpassing their native feature density.

Materials Science,Chemistry,Medicine
Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Tongxin Chang,Binyang Du,Haiying Huang,Tianbai He

DOI: https://doi.org/10.1021/acsami.6b07730

IF: 9.5

2016-01-01

ACS Applied Materials & Interfaces

Abstract:Two kinds of large-area ordered and highly tunable micro/submicro-nanopatterned surfaces in a complementary manner were successfully fabricated by elaborately combining block copolymer self-assembly and colloidal lithography. Employing a monolayer of polystyrene (PS) colloidal spheres assembled on top as etching mask, polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) or polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) micelle films were patterned into micro/submicro patches by plasma etching, which could be further transferred into micropatterned metal nanoarrays by subsequent metal precursor loading and a second plasma etching. On the other hand, micro/submicro-nanopatterns in a complementary manner were generated via preloading a metal precursor in initial micelle films before the assembly of PS colloidal spheres on top. Both kinds of micro/submicro-nanopatterns showed good fidelity at the micro/submicroscale and nanoscale; meanwhile, they could be flexibly tuned by the sample and processing parameters. Significantly, when the PS colloidal sphere size was reduced to 250 nm, a high-resolution submicro-nanostructured surface with 3-5 metal nanoparticles in each patch or a single-nanoparticle interconnected honeycomb network was achieved. Moreover, by applying gold (Au) nanoparticles as anchoring points, micronanopatterned Au arrays can serve as a flexible template to pattern bovine serum albumin (BSA) molecules. This facile and cost-effective approach may provide a novel platform for fabrication of micropatterned nanoarrays with high tunability and controllability, which are promising in the applications of biological and microelectronic fields.
The role of immunoglobulin A in endogenous bronchial defense mechanisms in chronic bronchitis.

T. Medici,H. Buergi

DOI: https://doi.org/10.1164/ARRD.1971.103.6.784

1971-06-01

American Review of Respiratory Disease

Abstract:Investigations were carried out to evaluate the role of secretory immunoglobulin A (11S IgA) in the recurrent infections of chronic bronchitis. The IgA content in sputum was related to damage of the bronchial epithelium and the degree of inflammation using the concentrations of lactic dehydrogenase, deoxyribonucleic acid fibers, and fibrinogen in the sputum as criteria of inflammation. The IgA content in sputum of patients with mild to moderate bronchitis of short duration increased significantly as a result of an inflammation-producing stimulus whereas patients with severe, far advanced bronchitis of long duration failed to show this response. Immunodiffusion studies suggested that in the latter patients the secretory “piece” was absent from the sputum. It is therefore assumed that the production of the secretory “piece” was partially or totally disturbed due to the damage of the bronchial epithelium. Consequently, the synthesis of immunologically active 11S secretory IgA was impaired. The absence of thi...
Synthesis of Liquid Crystalline Block Copolymers Self-assembled into Sub-5 Nm Microdomains

Hui Cao,Xuemiao Li,Yuyun Liu,Hai Deng

DOI: https://doi.org/10.2494/photopolymer.32.413

2019-01-01

Journal of Photopolymer Science and Technology

Abstract:The directed self-assembly (DSA) of block copolymers (BCPs) is a potentially feasible option for next-generation lithography, due to its potential high resolution and low cost. The smallest domain spacing of conventional BCPs such as polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) are larger than 10 nm, which limits their application in sub-10 nm lithography when compared with EUVL technology. BCPs with high chi value could further reduce the domain spacing to achieve higher resolution. In this work, we synthesized a series of BCPs with biphenyl-typed liquid crystalline (LC) block and fluorine-containing block. With strongly segregated repulsion between isotropic coil and anisotropic LC blocks, the new BCPs yielded highly ordered nanostructures with lamellar and hexagonal morphologies. The smallest feature size was 4.8 nm, showing great potential for sub-5 nm patterning technology.
Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning (Small 48/2024)

Cheng‐Hsun Tung,Feng Ye,Wei‐Yi Li,The Anh Nguyen,Ming‐Chang Lee,Tao Wen,Zi‐Hao Guo,Stephen Z. D. Cheng,Rong‐Ming Ho

DOI: https://doi.org/10.1002/smll.202470359

IF: 13.3

2024-11-29

Small

Abstract:Nanopatterning In article number 2403581, Stephen Z. D. Cheng, Rong‐Ming Ho, and co‐workers demonstrate well‐defined line nanopatterns with sub‐10 nm feature size fabricated via directed self‐assembly of POSS‐based giant surfactant. This giant surfactant exhibits strong segregation strength, and fast self‐assembly as well as excellent etching contrast, enabling reactive ion etching to create topographic nanopatterns. This bottom‐up approach suggests a cost‐effective method for next‐generation lithography applications.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Nanoscale patterning through self-assembly of hydrophilic block copolymers with one chain end constrained to surface

Xiang Gao,Shiping Zhu,Heather Sheardown,John L. Brash

DOI: https://doi.org/10.1016/j.polymer.2010.02.021

IF: 4.6

2010-01-01

Polymer

Abstract:Poly(oligo(ethylene glycol) methacrylate) (POEGMA)-block-poly(2-(methacryloyloxy) ethyl trimethylammonium chloride) (PMETAC) brushes were synthesized on silicon wafer surfaces by a surface-initiated atom transfer radical polymerization (ATRP) method. Salt-triggered collapse of the polyelectrolyte in solution was employed to induce phase segregations between the two hydrophilic blocks and thus to develop nanoscale patterns. The smallest feature size was about 10 nm and was tunable on the nanoscale. Various patterns including spherical aggregates, wormlike aggregates, and line patterns were obtained through adjusting the upper block layer thickness. These nanopatterns could switch between the different morphologies through the treatment of selective solvents. The adsorption behavior of fibrinogen on these patterns was also studied by ellipsometry, water contact angle measurement, AFM and radio labelling method. The results showed that these nanopatterns possess the ability to pattern proteins.
Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Peng Chen,Haojun Liang,Ru Xia,Jiasheng Qian,Xiaoshuang Feng

DOI: https://doi.org/10.1021/ma301203a

IF: 5.5

2013-01-01

Macromolecules

Abstract:Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.
Rapid Self-Assembly of Block Copolymers for Flower-Like Particles with High Throughput.

Zhen Wang,Yuanyuan Cao,Xinyue Zhang,Dingguan Wang,Ming Liu,Zhigang Xie,Yapei Wang

DOI: https://doi.org/10.1021/acs.langmuir.6b03940

IF: 3.9

2016-01-01

Langmuir

Abstract:The self-assembly of block copolymers has evolved into a foremost bottom-up approach for building polymeric materials. Historical challenges exist within this lively field, including the scalability and elegant simplicity of self-assembled aggregates with predictable structures. Here, we report a generally applicable strategy for the rapid self-assembly of poly(ethylene glycol)-block-poly(l-lactic acid) with the help of a single oil-in-water emulsion. A kind of flower-like polymer particle with filamentous surface branches is rapidly formed after removing the oil phase from the emulsion system. Moreover, the dimension of the branched filaments and the spherical internal core can be controlled through regulating the block ratio and the emulsification conditions. In particular, we propose an explosion theory as a balance between phase separation and interchain interaction for explaining the formation of the branched structures of the flower-like particles. The particles with high throughput are further functionalized with polypyrrole for their use in enhanced photoelectric-sensing applications.

Fast Self-Assembly of Polystyrene-B-poly(fluoro Methacrylate) into Sub-5 Nm Microdomains for Nanopatterning Applications

Facile Engineering of Nano- and Microparticles Via Self-Assembly of Homopolymers

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Design and synthesis of novel directed self-assembly block copolymers for sub-10 nm lithography application

Ultra-fast Directly Self-Assembly Materials for Sub-5 Nm Lithographic Patterning

Ultra-Fast Block Copolymers for Sub-5 Nm Lithographic Patterning

Synthesis of Fluorine-containing Polyacrylamide Block Copolymer and Their Application for Rapidly Formation of Sub-10 Nm Microdomains

Facile synthesis and hierarchical assembly of polystyrene-block- poly (perfluorooctylethyl acrylates)

Directed Self-Assembly of Poly(styrene-B-vinyl Acetate) Block Copolymers on Chemical Patterns for Sub-10 Nm Nanopatterning Via Thermal Annealing

Poly(2-vinylpyridine)-b-poly(fluorinated Methacrylate) Block Copolymers Forming 5 Nm Domains Containing Metallocene

Facilitated and Site-Specific Assembly of Functional Polystyrene Microspheres on Patterned Porous Films

Synthesis of a Fluoromethacrylate Hydroxystyrene Block Copolymer Capable of Rapidly Forming Sub-5 nm Domains at Low Temperatures

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

The role of immunoglobulin A in endogenous bronchial defense mechanisms in chronic bronchitis.

Synthesis of Liquid Crystalline Block Copolymers Self-assembled into Sub-5 Nm Microdomains

Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning (Small 48/2024)

Nanoscale patterning through self-assembly of hydrophilic block copolymers with one chain end constrained to surface

Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Rapid Self-Assembly of Block Copolymers for Flower-Like Particles with High Throughput.