Abstract:Directed self-assembly (DSA) of block copolymers (BCPs) combines advantages of conventional photolithography and polymeric materials and shows competence in semiconductors and data storage applications. Driven by the more integrated, much smaller and higher performance of the electronics, however, the industry standard polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) in DSA strategy cannot meet the rapid development of lithography technology because its intrinsic limited Flory-Huggins interaction parameter (χ). Despite hundreds of block copolymers have been developed, these BCPs systems are usually subject to a trade-off between high χ and thermal treatment, resulting in incompatibility with the current nanomanufacturing fab processes. Here we discover that polystyrene-b-poly(propylene carbonate) (PS-b-PPC) is well qualified to fill key positions on DSA strategy for the next-generation lithography. The estimated χ-value for PS-b-PPC is 0.079, that is, two times greater than PS-b-PMMA (χ = 0.029 at 150 °C), while processing the ability to form perpendicular sub-10 nm morphologies (cylinder and lamellae) via the industry preferred thermal-treatment. DSA of lamellae forming PS-b-PPC on chemoepitaxial density multiplication demonstrates successful sub-10 nm long-range order features on large-area patterning for nanofabrication. Pattern transfer to the silicon substrate through industrial sequential infiltration synthesis is also implemented successfully. Compared with the previously reported methods to orientation control BCPs with high χ-value (including solvent annealing, neutral top-coats, and chemical modification), the easy preparation, high χ value, and etch selectivity while enduring thermal treatment demonstrates PS-b-PPC as a rare and valuable candidate for advancing the field of nanolithography.

Poly(2-vinylpyridine)-b-poly(fluorinated Methacrylate) Block Copolymers Forming 5 Nm Domains Containing Metallocene

Boundary-Directed Epitaxy of Block Copolymers

Sub-10 Nm Feature Sizes of Disordered Polystyrene-block-poly(methyl Methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively Distributed Charge Interactions

Synthesis of Liquid Crystalline Block Copolymers Self-assembled into Sub-5 Nm Microdomains

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Block Copolymers with a Fluoro-Block for 5 Nm DSA Patterning Application

Synthesis of Fluorine-containing Polyacrylamide Block Copolymer and Their Application for Rapidly Formation of Sub-10 Nm Microdomains

Methacrylic Block Copolymers Containing Liquid Crystalline and Fluorinated Side Chains Capable of Fast Formation of 4 Nm Domains

Synthesis of a Fluoromethacrylate Hydroxystyrene Block Copolymer Capable of Rapidly Forming Sub-5 nm Domains at Low Temperatures

Directed Self-Assembly of Poly(styrene-B-vinyl Acetate) Block Copolymers on Chemical Patterns for Sub-10 Nm Nanopatterning Via Thermal Annealing

Fabrication of High Χ-Low N Block Copolymers with Thermally Stable Sub-5 Nm Microdomains Using Polyzwitterion As a Constituent Block

High χ P2PFBEMA- b -P2VP Block Copolymers Forming 6-8 nm Domains for Semiconductor Lithography

Ultra-Fast Block Copolymers for Sub-5 Nm Lithographic Patterning

Self-assembly of Blended PS-b-P2VP Block Copolymers

Design and synthesis of novel directed self-assembly block copolymers for sub-10 nm lithography application

Synthesis of Highly Ordered Fluorinated Copolymers with One Polyhydroxystyrene Block for Subsequent Metal Incorporation

Si Containing Block Copolymers Quickly Assemble into Sub-6 Nm Domains

Directed Self-Assembly of Polystyrene-b-poly(propylene Carbonate) on Chemical Patterns Via Thermal Annealing for Next Generation Lithography

Morphology Control of Perpendicularly Oriented Lamellar Films from Azobenzene-Containing Block Copolymers with Different Spacer Lengths

Tunable Thin Film Periodicities by Controlling the Orientation of Cylindrical Domains in Side Chain Liquid Crystalline Block Copolymers

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat