Abstract:Binary polymer brush patterns were fabricated via photodeprotection of an aminosilane with a photo-cleavable nitrophenyl protecting group. UV exposure of the silane film through a mask yields micrometre-scale amineterminated regions that can be derivatised to incorporate a bromine initiator to facilitate polymer brush growth via atom transfer radical polymerisation (ATRP). Atomic force microscopy (AFM) and imaging secondary ion mass spectrometry (SIMS) confirm that relatively thick brushes can be grown with high spatial confinement. Nanometre-scale patterns were formed by using a Lloyd's mirror interferometer to expose the nitrophenyl-protected aminosilane film. In exposed regions, protein-resistant poly(oligo(ethylene glycol) methyl ether methacrylate) (POEGMEMA) brushes were grown by ATRP and used to define channels as narrow as 141 nm into which proteins could be adsorbed. The contrast in the pattern can be inverted by (i) a simple blocking reaction after UV exposure, (ii) a second deprotection step to expose previously intact protecting groups, and (iii) subsequent brush growth via surface ATRP. Alternatively, two-component brush patterns can be formed. Exposure of a nitrophenyl-protected aminosilane layer either through a mask or to an interferogram, enables growth of an initial POEGMEMA brush. Subsequent UV exposure of the previously intact regions allows attachment of ATRP initiator sites and growth of a second poly(cysteine methacrylate) (PCysMA) brush within photolithographically-defined micrometre or nanometre scale regions. POEGMEMA brushes resist deposition of liposomes, but fluorescence recovery after photobleaching (FRAP) studies confirm that liposomes readily rupture on PCysMA "corrals" defined within POEGMEMA "walls". This leads to the formation of highly mobile supported lipid bilayers that exhibit similar diffusion coefficients to lipid bilayers formed on surfaces such as glass.

Nanoscale patterning through self-assembly of hydrophilic block copolymers with one chain end constrained to surface

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Hierarchical Self-Assembly of Spider Silk-Like Block Copolymers

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Micrometre And Nanometre Scale Patterning Of Binary Polymer Brushes, Supported Lipid Bilayers And Proteins

Fabrication of micropatterns of nanoarrays on a polymeric gel surface.

Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing

Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates

Netlike Knitting of Polyelectrolyte Multilayers on Honeycomb-Patterned Substrate.

Sequential Self-Assembly of Polystyrene- block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing

Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning (Small 48/2024)

Substrate patterning using regular macroporous block copolymer monoliths as sacrificial templates and as capillary microstamps

Free-standing, patternable nanoparticle/polymer monolayer arrays formed by evaporation induced self-assembly at a fluid interface.

Cooperative self-assembly and crystallization into fractal patterns by PNIPAM-based nonlinear multihydrophilic block copolymers under alkaline conditions

Constructing a Comprehensive Nanopattern Library through Morphological Transitions of Block Copolymer Surface Micelles via Direct Solvent Immersion

Growing Embossed Nanostructures of Polymer Brushes on Wet-Etched Silicon Templated Via Block Copolymers