Formation of a monolayer h -BN nanomesh on Rh (111) studied using in-situ STM

GuoCai Dong,Yi Zhang,Joost W. M. Frenken
DOI: https://doi.org/10.1007/s11433-017-9169-7
2018-01-01
Abstract:As a member of the 2D family of materials, h -BN is an intrinsic insulator and could be employed as a dielectric or insulating inter-layer in ultra-thin devices. Monolayer h -BN can be synthesized on Rh (111) surfaces using borazine as a precursor. Using in-situ variable-temperature scanning tunneling microscopy (STM), we directly observed the formation of h in real-time. By analyzing the deposition under variable substrate temperatures and the filling rate of the h -BN overlayer vacant hollows during growth, we studied the growth kinetics of how the borazine molecules construct the h -BN overlayer grown on the Rh surface.
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