Al-free Cladding-Layer Blue Laser Diodes with a Low Aspect Ratio in Far-Field Beam Pattern

Meixin Feng,Qian Sun,Jianping Liu,Zengcheng Li,Yu Zhou,Hongwei Gao,Shuming Zhang,Hui Yang
DOI: https://doi.org/10.1088/1674-4926/39/8/084004
2018-01-01
Abstract:c-plane GaN-based blue laser diodes (LDs) were fabricated with Al-free cladding layers (CLs) and deepened etching depth of mesa structure, so the aspect ratio of the far-field pattern (FFP) of the laser beam can be reduced to as low as 1.7, which is nearly the same as conventional AlGaInP-based red LDs. By using GaN CLs, the radiation angle of the laser beam θ⊥ is only 10.1° in the direction perpendicular to the junction plane. After forming a deeply etched mesa, the beam divergence angle parallel to the junction plane of FFP, θ//, increases from 4.9° to 5.8°. After using the modified structure, the operation voltage of LD is effectively reduced by 2 V at an injection current of 50 mA, but the threshold current value increases. The etching damage may be one of the main reasons responsible for the increase of the threshold current.
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