Enhancement of the Emission Efficiency of InGaN Films by Suppressing the Incorporation of Unintentional Gallium Atoms

J. Yang,S. T. Liu,X. W. Wang,D. G. Zhao,D. S. Jiang,P. Chen,J. J. Zhu,Z. S. Liu,F. Liang,W. Liu,L. Q. Zhang,H. Yang,W. J. Wang,M. Li
DOI: https://doi.org/10.1016/j.spmi.2017.09.039
IF: 3.22
2018-01-01
Superlattices and Microstructures
Abstract:InGaN samples are grown using metalorganic chemical vapor deposition (MOCVD) and the dependences of structural and luminescence properties of InGaN layers on growth temperature are studied. It is found that the luminescence properties of InGaN layer are improved by increasing growth temperature properly. However, when the growth temperature of InGaN layer is too higher (740 degrees C in our work), a large amount of unintentionally incorporated gallium atoms enter into InGaN, and a spiral growth mode dominates in this case. It results in an inferior crystalline and interface quality, and ultimately degrades the luminescence of InGaN. (C) 2017 Elsevier Ltd. All rights reserved.
What problem does this paper attempt to address?