PREPARATION AND CHARACTERISTIC OF NANOMETER TiOx OPTICAL THIN FILM

王鹤,杨宏
DOI: https://doi.org/10.3969/j.issn.1002-2082.2001.05.012
2001-01-01
Journal of Applied Optics
Abstract:This paper reports some investigation results of nanometer TiOx optical thin film prepared by atmospheric pressure chemical vapor deposition(APCVD),analyzes the influence of temperature on constructure and refractive index of TiOx,the antireflection characteristics of TiOx deposited on polished wafers and textured wafers are dicussed,the optimal process is proposed.
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