NANOMETER TiOx OPTICAL THIN FILM PREPARED BY APCVD AS ARC FOR SINGLE SILICON SOLAR CELLS

杨宏,王鹤,于化丛,奚建平,胡宏勋,陈光德
DOI: https://doi.org/10.3321/j.issn:0254-0096.2002.04.008
2002-01-01
Abstract:This paper reports some investigation results on nanometer TiOx optical thin film prepared by atmospheric pressure chemical vapor deposition (APCVD), and the influence of temperature on structure and refractive index of TiOx is discussed. The experiments demonstrate the requirement of antireflection coating (ARC) for silicon solar cell and optimized the process of TiOx ARC for application to commercial silicon photovoltaic cells. The performance of TiOx prepared by this optimal process is steady, and the color of TiOx for large area c-Si solar cells is uniform. The optical ARC obtains a 10% average increase of efficiency for large area c-Si solar cells.
What problem does this paper attempt to address?