Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO2 thin films

Xiaoyun Hu,Jun Fan,Ting Li,Dekai Zhang,Jintao Bai,Xun Hou
DOI: https://doi.org/10.1117/12.575510
2005-01-01
Abstract:Nanometer TiO2 thin films are prepared by a sol-gel method and the effects of preparation technique on the microstructure and surface morphology of the obtained materials are studied using X-ray Diffraction [XRD], IR spectrum [IR], UV-VIS spectrum [UV-VIS], AFM and X-ray photoelectron spectroscopy [XPS]. The results show that the TiO2 thin films are of anatase and rutile phase structures when annealed in a temperature range from 450 degrees C to 600 degrees C. When heated up to 700 degrees C, the structure of TiO2 film changed into rutile completely. In the TiO2 thin films, there is some residual carbon from the starting organometaltic components and a small amount of sodium ions diffused from the glass substrates. During heat-treatment, the absorption peak of water become weak gradually and the organic groups are disappeared completely at 500 degrees C. Optimum film layers are obtained for the UV absorbance index. AFM result shows that the rough morphology of surface [RMS] of films is about 2-3nm or so.
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