Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

YU Hua-Wa,DU Ya-Li,WANG Jing,LIU Jing
DOI: https://doi.org/10.3969/j.issn.1006-8341.2007.02.019
2007-01-01
Abstract:ZnO thin films with(002) orientation have been deposited on Si(100) substrate by radio frequency(RF) magnetron sputtering technique.The influence of RF power and oxygen ratio on the grain size,the residual stress and optical properties was investigated by X-ray diffraction and transmission spectra.The results show that the crystallization of the ZnO film deposited with sputtering power(100W) and oxygen ratio(60%),can obtain its best c-axis orientation and crystallization and tension stress of the film reaches the lowest.
What problem does this paper attempt to address?