Abstract:Physical properties of ZnO thin films are of great importance for their potential application. In this paper, we reported the electrical and optical properties of undoped ZnO films with a high dependence oil the nucleation and growth kinetics. These ZnO films were deposited on glass substrates within the temperature range of 250-350 degrees C by pulsed-spray evaporation chemical vapor deposition (PSE-CVD). X-ray diffraction (XRD) shows that ZnO films grow in the c-axis orientated hexagonal structure. The inspection of the surface morphology with scanning electron micrographs (SEM) shows a substantial effect of the growth temperature, which was directly correlated with the nucleation kinetics. A comprehensive nucleation and growth process was also proposed for the interpretation of changeable film morphology and corresponding electrical conductivity. The films deposited at intermediate growth temperatures of 310-340 degrees C show compact structures and consequent high electrical conductivity, Which Was Still improved with increase of film thickness. Ill contrast to the electrical conductivity, the optical hand gal) rather shows a correlation with the size of the crystals forming the films rather than with their arrangement. The band gap energy decreases from 3.56 to 3.42 eV toward the bulk value Upon the increase of the crystallite size from 15 to 30 nm.

Influence of magnetron sputtering growth parameters on the microstructure and optical properties of ZnO films

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Influence of O_2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Structural evolution of ZnO films deposited by rf magnetron sputtering on glass substrate

Crystal Growth of Undoped ZnO Films on Si Substrates under Different Sputtering Conditions

Influence of Sputtering Power on Properties of ZnO Thin Films Fabricated by RF Sputtering in Room Temperature

STRUCTURAL AND OPTICAL STUDIES OF ZnO FILMS GROWN AT LOW TEMPERATURE

Effect of the Substrate Temperature on the Property of ZnO Films Deposited by Magnetron Sputtering with DC at the Low Power

Growth Temperature Dependent Evolutions of Microstructural, Optical and Magnetic Properties of Zn0.75Co0.25O Films

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Effect of substrate-tilting angle-dependent grain growth and columnar growth in ZnO film deposited using radio frequency (RF) magnetron sputtering method

Deposition Condition Investigation of High c-axis Preferred Orientation ZnO Films Produced by RF Magnetron Sputtering

Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature

Influences of Substrate Temperature on Properties of ZGO Thin Films Prepared by Middle-frequency Alternative Magnetron Sputtering

Growth of Cubic MgxZn1-xO Films and Characterization

Structures and Electric Properties of RF Sputtered ZnO Films