Effects of Hydrogen Treatment in Barrier on the Electroluminescence of Green InGaN/GaN Single-Quantum-Well Light-Emitting Diodes with V-Shaped Pits Grown on Si Substrates

Qing-feng Wu,Sheng Cao,Chun-lan Mo,Jian-li Zhang,Xiao-lan Wang,Zhi-jue Quan,Chang-da Zheng,Xiao-ming Wu,Shuan Pan,Guang-xu Wang,Jie Ding,Long-quan Xu,Jun-lin Liu,Feng-yi Jiang
DOI: https://doi.org/10.1088/0256-307x/35/9/098501
2018-01-01
Chinese Physics Letters
Abstract:Effect of hydrogen(H 2 ) treatment during the GaN barrier growth on the electroluminescence performance of green In GaN/GaN single-quantum-well light-emitting diodes(LEDs) grown on Si substrates is experimentally investigated. We prepare two LED samples with different carrier gas compositions during the growth of GaN barrier. In the H 2 free LED, the GaN barrier is grown in full nitrogen(N 2 ) atmosphere. For the other H 2 treated LED, a mixture of N 2 and H 2 was used as the carrier gas. It is observed that V-shaped pits decrease in size after H 2 treatment by means of the scanning electron microscope. Due to the fact that the p–n junction interface would be closer to the p-GaN as a result of smaller V-shaped pits, the tunneling barrier for holes to inject into the In GaN quantum well would become thicker after H 2 treatment. Hence, the external quantum efficiency of the H 2 treated LED is lower compared to the H 2 free LED. However, LEDs would exhibit a better leakage behavior after H 2 treatment during the GaN barrier growth because of more effective blocking of the threading dislocations as a result of the H 2 etching at V-shaped pits.
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