Ge-Based Asymmetric RRAM Enable 8F(2) Content Addressable Memory

Bing Chen,Yi Zhang,Wei Liu,Shun Xu,Ran Cheng,Rui Zhang,Yi Zhao
DOI: https://doi.org/10.1109/led.2018.2856537
IF: 4.8157
2018-01-01
IEEE Electron Device Letters
Abstract:In this work, we developed an asymmetric Ge-based RRAM using a fully CMOS compatible process. Due to the adoption of a thin AlOx/GeOx interfacial layer, the TiN/HfOx/AlOx/GeOx/Ge structured RRAM shows both excellent switching behavior and diodelike rectifying characteristics. Based on the asymmetric RRAM device, a high density nonvolatile content addressable memory was proposed and demonstrated, and its function was verified by experimental measurements. This novel two-asymmetric RRAM-based TCAM cell with only 8F(2) size is very promising for future energy and area-efficient IoT and Internet applications.
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