Two-dimensional ferroelectric tunnel junction: the case of SnSe

Xin-Wei Shen,Yue-Wen Fang,Bobo Tian,Chun-Gang Duan
2018-01-01
Abstract:Ferroelectric tunnel junctions (FTJs) have triggered considerable attention in the advanced applications of non-volatile information devices. However, critical thickness for ferroelectricity limits FTJS towards their applications at the nanoscale. Recently, some two-dimensional (2D) materials have been reported to show intrinsic in-plane ferroelectricity. Here, through the opposite dopants on the two sides of the monolayer group-IV monochalcogenides (GIVMs), we design a novel 2D-FTJ employing p-type semiconductor/ferroelectric/n-type semiconductor homostructure, coupling the electron tunneling with the robust in-plane ferroelectricity. This structure makes it possible to dynamically modulate tunneling electroresistance (TER) effect. Combining first-principles calculations with non-equilibrium Greenu0027s function formalism, herein, we reveal this mechanism by using In:SnSe/SnSe/Sb:SnSe homostructure as a prototypical example, where a large TER effect of around 1460% is obtained. Compares with the normal vertical FTJs, this lateral 2D-FTJ enormously improves the TER ratio and shows exciting prospects for device applications with higher data integration and reliable information retention in the future.
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