High Tunneling Electroresistance in Ferroelectric Tunnel Junctions Based on 2-D Bilayer Ferroelectric CuInP2Se6/Ga2O2O3 Van Der Waals Heterostructure

Leitao Lei,Xiaohong Zheng,Yan-Hong Zhou,Ke-Qiu Chen
DOI: https://doi.org/10.1109/ted.2024.3411576
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:Giant tunneling electroresistance (TER) has been realized via manipulating the electric polarization direction of the ferroelectric material in van der Waals heterostructure (vdWH) ferroelectric tunnel junctions (FTJs)where the vdWH is constructed by combining a ferro-electric material with a nonferroelectric material. In this work, we propose a new FTJ model by employing bilayer ferroelectric vdWH composed of two out-of-plane polarized ferroelectric materials. The 2-D ferroelectric materialsCuInP(2)Se(6 )and Ga2O3, which both have two opposite polarization states P up arrow and P down arrow, are selected as an example to form the bilayer ferroelectric vdWHs and the corresponding FTJs to validate our model. The energy bands of P up arrow up arrow state of the vdWH indicate an insulating state with a bandgap of 0.634 eV, while that of the P down arrow down arrow state is zero, resulting in a metallic behavior, so a robust ferroelectric polarization-controlled switch behavior between the high conductance state in P down arrow down arrow state and the low conductance state in P up arrow up arrow state in CuInP2Se6/Ga(2)O(3 )vdWH is obtained. Then, based on this vdWH, a 2-D transverse FTJ with P up arrow up arrow or P down arrow down arrow state's vdWH as the tunneling barrier and (Ga0.75Sn0.25)(2)O(3 )monolayer (exhibiting n-type doping) as electrodes is designed. The TER ratio as high as 106%can be achieved in the FTJ. An analysis via the work function model, charge redistribution, and local density of state (LDOS) is performed to analyze the above phenomena. Our work provides a feasible method to design high-performance FTJs with 2-D bilayer ferroelectric vdWHs and suggests the great potential of specific CuIn P2Se6/Ga(2)O(3 )vdWH in the design of high-performance FTJs and the application in high-density nonvolatile mem-ory devices.
What problem does this paper attempt to address?