Giant Tunneling Electroresistance in 2-Din-plane Ferroelectric Tunnel Junctions Based on a Α-In2se3/cd3c2 Heterostructure

Ziqi Han,Xiaohong Zheng,Chun-Sheng Liu,Lei Zhang,Weiyang Wang,Zhi Zeng
DOI: https://doi.org/10.1109/ted.2024.3462378
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:Ferroelectric tunnel junctions (FTJs), com-posed of two metallic or semiconductor leads separated bya thin ferroelectric tunnel barrier, demonstrate significant potential for nonvolatile memory devices. With the development of device miniaturization, 2-D FTJs have attracted increasing attention due to the unique characteristics of material stability, atomic thickness, and high tunnel electroresistance (TER) ratio. In this work, a 2-D in-plane vander Waals (vdW) FTJ constructed using a In2Se3/Cd(3)C(2 )heterostructure is designed, and its electron transport properties have been investigated based on density functional calculations combined with a non equilibrium Green'sfunction (NEGF) technique. The results demonstrate thata TER ratio of 106%is achieved due to the change from Schottky- to Ohmic-type contact at the In2Se3/Cd(3)C(2)inter-face accompanied by ferroelectric polarization reversal.Meanwhile, the current-voltage (I-V) characteristics at low bias voltages indicate significant amplitude differencesbetween currents under different polarization states. TheTER can be stably maintained above 106%, indicating twoideal states "0" and "1" for data storage. The mechanismfor the Schottky to Ohmic switching is explained by differ-ent charge transfers between the contacted surfaces of thetwo materials under different polarization directions, whichare further controlled by the work functions of them. Consequently, work function engineering offers a promisingmethod for constructing 2-D ferroelectric vdW heterostructures and FTJs, which has promising application potentialin nanoscale high-density ferroelectric memory devices
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