Enhanced tunneling electroresistance through interfacial charge-modulated barrier in α-In2Se3-based ferroelectric tunnel junction

Shiying He,Daifeng Zou
DOI: https://doi.org/10.1088/1361-648x/ad1301
2023-12-07
Journal of Physics Condensed Matter
Abstract:The manipulation of tunneling resistance is critical for ferroelectric tunnel junction (FTJ) devices. In this work, we propose a mechanism to manipulate tunneling resistance through interfacial chargemodulated barrier in two-dimensional n-type semiconductor/ferroelectric FTJs. Driven by ferroelectric reversal, different effective tunneling barriers are realized by the depletion or accumulation of electrons near the n-type semiconductor surface in such devices. Thus, the tunneling resistance in FTJs undergoes significant changes for different polarization orientations, resulting in a giant tunneling electroresistance (TER) effect. To illustrate this idea, we construct two-dimensional in-plane FTJs based on n-InSe/α-In2Se3 van der Waals (vdW) heterostructures. Based on the electronic transport calculations, it is found that TER ratio can reach 4.20 × 103% in the designed FTJs. The physical origin of the giant TER effect is verified through analysis of the effective potential of the n-InSe/α-In2Se3 vdW heterostructures and the real-space transmission eigenstates of the designed FTJs. This work contributes to the knowledge of carrier tunneling mechanisms at the interface of semiconductor/In2Se3 vdW heterostructures, and providing a significant insight into the TER effect of this FTJ systems, also presenting an alternative approach for the design of FTJ-based devices.
physics, condensed matter
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