Alloying Effects on Ductility of Nanostructured Cu-X (X = Zr and W) Thin Films

J. T. Zhao,J. Y. Zhang,H. Z. Yuan,K. Wu,G. Liu,J. Sun
DOI: https://doi.org/10.1016/j.scriptamat.2018.04.027
IF: 6.302
2018-01-01
Scripta Materialia
Abstract:Alloying effect on tensile ductility of nanostructured Cu-X (X = Zr and W) thin films was studied in comparison. Both Zr and W atoms segregated at grain boundaries (GBs) and increased the GB cohesion energy, leading to similar increase of ductility in as-deposited Cu-X films. After annealing treatment, however, changes in ductility showed different alloying effect: the Cu-Zr one increased while the Cu-W one decreased when compared with their as-deposited counterparts. This discrepancy was rationalized by different microstructural evolution that intergranular CuZr amorphous layer was produced in the Cu-Zr film while intergranular W grains were formed in the Cu-W one. (C) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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