Abstract:Atomic layer deposition (ALD) has drawn considerable attention recently for depositing functional films on polymers. However, most polymers are inert and thermally fragile, thus posing many challenges during deposition. This study presents a novel strategy for ALD of an ultrathin Al2O3 film on alkali-treated polyethylene terephthalate (PET) via polydopamine (PDA) modification. The tightly adherent PDA layer exhibited numerous robust active sites (phenolic hydroxyl groups), which are highly desirable for precursor chemisorption during ALD. The modification process was systematically characterized. The PET substrate showed many active sites and a smooth surface after 24 h of PDA deposition. The island growth mode was found during the ALD of an Al2O3 film on the samples. The PDA layer absorbed a large quantity of the precursor (trimethylaluminum [TMA]) during the initial deposition, contributing to the early nucleation and continuous growth of the Al2O3 film. In addition, the presence of the PDA layer narrowed the region of TMA infiltration into the PET, resulting in the formation of a conformal film on the surface. Transmission electron microscopy indicated that an Al2O3 film with a thickness of about 10 nm was formed on the PDA-modified PET substrate after 100 ALD cycles, and exhibited excellent water vapor blocking characteristics. These findings suggest that the added PDA layer has tremendous potential to act as a bonding layer between polymers and ALD functional films.

Influence of Reactive Surface Groups on the Deposition of Oxides Thin Film by Atomic Layer Deposition

The Growth Mechanisms of TiO2 Film Onto PET Surfaces by Atomic Layer Deposition

Atomic Layer Deposition and Its Applications in Optical Thin Films

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Growth of ultrathin Al2O3 films on Polydopamine-modified polyethylene terephthalate by atomic layer deposition

Selective-area ALD for Positively and Negatively Charged Layers into the Ion-Beam Track-Etched Conical Pores in Polyethylene Terephthalate

Nucleation and Growth Study of Al2O3 Film Fabricated Through Atomic Layer Deposition on Pet Substrate

Dopamine facilitates Al2O3 film growth on polyethylene terephthalate by low-temperature plasma-enhanced atomic layer deposition

Atomic Layer Deposition of Tio2 from Tetrakis-Dimethyl-Amido Titanium or Ti Isopropoxide Precursors and H2o

Properties of Aluminum Oxide （alo X ） Barrier Coatings Deposited on Poly（Ethylene Terephthalate）（PET）Substrates by Reactive Magnetron Sputtering

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Preparation of TiO2–SiO2 film with high photocatalytic activity on PET substrate

Effect of Deposition Temperature on Al2O3 Films Deposited by Atomic Layers Deposition

Influence of Surface Preparation on Atomic Layer Deposition of Pt Films

Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Deposition of Oxides on Metal Surfaces

Dependence of inherent selective atomic layer deposition of FeO<sub>x</sub> on Pt nanoparticles on the coreactant and temperature

Nucleation and growth of gas barrier aluminium oxide on surfaces of poly(ethylene terephthalate) and polypropylene: effects of the polymer surface properties

Photocatalytic activities of TiO2 and TiO2/Al2O3 films coated on foam nickel substrates

Substrate-dependent ALD of Cux on TiO2 and its performance in photocatalytic CO2 reduction

In Situ X-Ray Photoelectron Spectroscopy Analysis of the Atomic Layer Deposition of Al2O3 on SiO X /si: Interface Dipole and Persistent Surface Groups

In situ x-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al 2 O 3 on SiO x /Si: Interface dipole and persistent surface groups.