Abstract:In this work, we have synthesized a highly periodic silicon nanowire (SiNW) arrays with the spacing from 300 nm to 1000 nm by combining nanosphere lithography (NSL) and metal-assisted chemical etching (MACE). It has been demonstrated that it is effective to produce large-area, well-separated and controlled SiNW arrays. We also present a simple method to solve the problem of distorting spherical shape by angled-deposition method according to shadowing effect during NSL process. So we do not need to reduce the diameter of polystyrene (PS) spheres heavily and avoid making spherical shape distorted and rough. The large-area Au meshes can be further optimized using angled-deposition method and have a small nanohole diameter and relatively large nanohole spacings. And the center-center distance of PSs used as mask merely keeps invariable with 820 nm and 1300 nm pitch after reactive ion etching (RIE) process. The method help improve the distortion of spherical shape heavily during NSL process so that we can obtain SiNW arrays with controlled diameter, length and density using the non-close-packed PSs as the mask. Furthermore, the SiNW arrays obtained by MACE can improve antireflection properties of silicon substrate. The high surface area of SiNW arrays makes the reflectance below 10% or less over a wavelength range of 300-1000 nm. The antireflection structure (ARS) is great of importance in application of nanoscale optical devices.

A Facile Synthesis of Silicon Nanowires/micropillars Structure Using Lithography and Metal-Assisted Chemical Etching Method

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Facile Synthesis of Silicon Micropillar Arrays Using Extreme Ultraviolet Lithography and Ag-Assisted Chemical Etching Method

Template-Free Fabrication of Silicon Micropillar Structures by a One-Step Masking/MACE Composite Method

Controlled Fabrication of Silicon Nanowires Via Nanosphere Lithograph and Metal Assisted Chemical Etching

Fabrication and optical properties of silicon nanopillar arrays with controllable surface structures

An Innovative Light Trapping Structure Fabrication Method on Diamond-Wire-Sawing Multi-Crystalline Silicon Wafers

Lithography-free Fabrication of Silicon Nanowire and Nanohole Arrays by Metal-Assisted Chemical Etching

Template-free fabrication of silicon micropillar/nanowire composite structure by one-step etching

Controllable Light-Induced Conic Structures in Silicon Nanowire Arrays by Metal-Assisted Chemical Etching.

Fabrication and characterization of silicon nanostructures based on metal-assisted chemical etching

Design Optimization and Antireflection of Silicon Nanowire Arrays Fabricated by Au-assisted Chemical Etching

Wafer-Scale Fabrication of Ultra-High Aspect Ratio, Microscale Silicon Structures with Smooth Sidewalls Using Metal Assisted Chemical Etching

Preparation of Large-Area Uniform Silicon Nanowires Arrays through Metal-Assisted Chemical Etching

Fabrication of Single-Crystal Silicon Nanotubes with Sub-10 Nm Walls Using Cryogenic Inductively Coupled Plasma Reactive Ion Etching.

Wafer-scale Fabrication of Silicon Nanowire Arrays with Controllable Dimensions

Fabrication of antireflective silicon nanowires array

Fabrication of Nanopillars Based on Silicon Oxide Nanopatterns Synthesized in Oxygen Plasma Removal of Photoresist

Fabrication Method of Silicon Nanostructures by Anisotropic Etching

Preparation of Silicon Nanowires and Porous Silicon Composite Structure by Electrocatalytic Metal Assisted Chemical Etching

Developing controllable anisotropic wet etching to achieve silicon nanorods, nanopencils and nanocones for efficient photon trapping