High Haze Textured Surface B-doped ZnO-TCO Films on Wet-Chemically Etched Glass Substrates for Thin Film Solar Cells

Chen Xinliang,Liu Jieming,Fang Jia,Chen Ze,Zhao Ying,Zhang Xiaodan

DOI: https://doi.org/10.1088/1674-4926/37/8/083003

2014-01-01

Abstract:Textured glass substrates with crater-like feature sizes of similar to 5-30 mu m were obtained using the chemical etching method through adjusting the treatment round (R). Pyramid-like boron-doped zinc oxide (ZnO:B) films with feature sizes of similar to 300-800 nm were deposited on the etched glass substrates by the metal organic chemical deposition (MOCVD) technique using water, diethylzinc and 1%-hydrogen-diluted diborane. The ZnO:B films on the etched glass with micro/nano double textures presented a much stronger light-scattering capability than the conventional ZnO:B on the flat glass and their electrical properties changed little. Typical etched glass-3R/ZnO:B exhibited a high root mean square (RMS) roughness of similar to 160 nm. The haze values at the wavelengths of 550 nm and 850 nm for etched glass-3R/ZnO:B sample were 61% and 42%, respectively. Finally, the optimized etched glass/ZnO:B was applied in the silicon (Si) based thin film solar cells. The high haze etched glass/ZnO:B substrates have potential merits for thin film solar cells.