Layout Optimization of Ggiscr Structure for On-Chip System Level Esd Protection Applications

Jie Zeng,Shurong Dong,Hei Wong,Tao Hu,Xiang Li
DOI: https://doi.org/10.1016/j.sse.2016.08.004
IF: 1.916
2016-01-01
Solid-State Electronics
Abstract:To improve the holding voltage, area efficiency and robustness, a comparative study on single finger, 4-finger and round shape layout of gate-grounded-nMOS incorporated SCR (GGISCR) devices are conducted. The devices were fabricated with a commercial 0.35 mu m HV-CMOS process without any additional mask or process modification. To have a fair comparison, we develop a new Figure-of-Merit (FOM) modeling for the performance evaluation of these devices. We found that the ring type device which has an It2 value of 18.9 A is area efficient and has smaller effective capacitance. The different characteristics were explained with the different effective ESD currents in these layout structures. (C) 2016 Elsevier Ltd. All rights reserved.
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