Strong Electroluminescence from Direct Band and Defects in Ge N+/p Shallow Junctions at Room Temperature

Guangyang Lin,Chen Wang,Cheng Li,Chaowen Chen,Zhiwei Huang,Wei Huang,Songyan Chen,Hongkai Lai,Chunyan Jin,Jiaming Sun
DOI: https://doi.org/10.1063/1.4949532
IF: 4
2016-01-01
Applied Physics Letters
Abstract:Strong room temperature electroluminescence with two emission peaks at around 0.786 eV and 0.747 eV from Ge n+/p shallow junctions was reported. The peak at around 0.786 eV comes from direct band luminescence (DBL) in n + Ge regions, while the peak fixing at 0.747 eV is resulted from defects induced by ion implantation. Heavy n-type doping in Ge renders realization of strong defect-related luminescence (DRL) feasible. The peak intensity ratio of DRL/DBL decreases with increase of injection current since more electrons are filled in Γ valley. Above all, the Ge n+/p shallow junction is fully compatible with the source and drain in Ge metal-oxide-semiconductor field effect transistors.
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