Fabrication and Emission Properties of a N-Zno/p-gan Heterojunction Light-Emitting Diode
Zhou Xin,Gu Shulin,Zhu Shunming,Ye Jiandong,Liu Wei,Liu Songmin,Hu Liqun,Zheng Youdou,Zhang Rong,Shi Yi
DOI: https://doi.org/10.3969/j.issn.1674-4926.2006.02.010
2006-01-01
Chinese Journal of Semiconductors
Abstract:We report the fabrication and characterization of light-emitting diodes based on n-ZnO/p-GaN heterojunctions. The n-type ZnO epilayer is deposited by metalorganic chemical vapor deposition (MOCVD) on a MOCVD grown Mg-doped p-GaN layer to form a p-n heterojunction. During the etching process, the relation between the etching depth and the etching time is linear in a HF and NH4 Cl solution of a certain ratio. The etching rates of the SiO2 and ZnO are well controlled,which are essential for device fabrication. The current-voltage relationship of this heterojunction shows a diode-like rectifying behavior. In contrast to previous reports,electroluminescence (EL) emissions are observed by the naked eye at room temperature from the n-ZnO/p-GaN heterojunction under forward- and reverse-bias. The origins of these EL emissions are discussed in comparison with the photoluminescence spectra.