ZnO Light-Emitting Diodes Fabricated on Si Substrates with Homobuffer Layers
Z. Z. Ye,J. G. Lu,Y. Z. Zhang,Y. J. Zeng,L. L. Chen,F. Zhuge,G. D. Yuan,H. P. He,L. P. Zhu,J. Y. Huang,B. H. Zhao
DOI: https://doi.org/10.1063/1.2783262
IF: 4
2007-01-01
Applied Physics Letters
Abstract:ZnO homojunction light-emitting diodes (LEDs), comprised of N–Al codoped p-type ZnO and Al-doped n-type ZnO layers, were fabricated on Si substrates with homobuffer layers. The current-voltage measurements showed typical diode characteristic with a threshold voltage of about 3.3V. The electroluminescence (EL) bands at 110K consisted of a near-band-edge emission at 3.18eV and a deep level emission at 2.58eV. The EL emissions were assigned as radiative recombinations, presumably of donor-acceptor pairs, in the p-type layer of the LED. The quenching of EL with temperature was attributed to the degradation of p-type conducting of the ZnO:(N,Al) layer.