1.7Ev Al0.2ga0.8as Solar Cells Epitaxially Grown on Silicon by Ssmbe Using A Superlattice and Dislocation Filters

Arthur Onno,Jiang Wu,Qi Jiang,Siming Chen,Mingchu Tang,Yurii Maidaniuk,Mourad Benamara,Yuriy I. Mazur,Gregory J. Salamo,Nils-Peter Harder,Lars Oberbeck,Huiyun Liu
DOI: https://doi.org/10.1117/12.2208950
2016-01-01
Abstract:Lattice-mismatched 1.7eV Al0.2Ga0.8As photovoltaic solar cells have been monolithically grown on Si substrates using Solid Source Molecular Beam Epitaxy (SSMBE). As a consequence of the 4%-lattice-mismatch, threading dislocations (TDs) nucleate at the interface between the Si substrate and III-V epilayers and propagate to the active regions of the cell. There they act as recombination centers and degrade the performances of the cell. In our case, direct AlAs/GaAs superlattice growth coupled with InAlAs/AlAs strained layer superlattice (SLS) dislocation filter layers (DFLSs) have been used to reduce the TD density from 1x10(9) cm(-2) to 1(+/- 0.2) x10(7) cm(-2). Lattice-matched Al0.2Ga0.8As cells have also been grown on GaAs as a reference.The best cell grown on silicon exhibits a V-oc of 964mV, compared with a V-oc of 1128mV on GaAs. Fill factors of respectively 77.6% and 80.2% have been calculated. Due to the lack of an anti-reflection coating and the non-optimized architecture of the devices, relatively low J(sc) have been measured: 7.30mA.cm(-2) on Si and 6.74mA.cm(-2) on GaAs. The difference in short-circuit currents is believed to be caused by a difference of thickness between the samples due to discrepancies in the calibration of the MBE prior to each growth. The bandgap-voltage offset of the cells, defined as E-g/q-V-oc, is relatively high on both substrates with 736mV measured on Si versus 572mV on GaAs. The non-negligible TD density partly explains this result on Si. On GaAs, non-ideal growth conditions are possibly responsible for these suboptimal performances.
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